In this work, our goal is to study the effect of the total pressure and the charging voltage on the amplification and propagation of non-uniformities in volume for a XeCl laser. This study is executed by using a parallel resistor network model (PRN). In this model, the surface of discharge is divided ideally into a resistances network in parallel. The obtained results show clearly that the formation of the plasma non-uniformity in volume and on a large scale is in this case related mainly to the chemical kinetics of the laser medium, and the increase in the pressure and applied voltage discharge parameters consequently amplifies any non-uniformity.
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