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Al2O3 antireflection coatings for silicon solar cells

Dobrzański L.A., Szindler M.

Journal of Achievements in Materials and Manufacturing Engineering

2013

Vol. 59, nr 1

13--19

Purpose: The aim of this paper was to investigate changes in surface morphology and optical properties of thin films of Al2O3. Thin films were prepared using atomic layer deposition (ALD) method. Design/methodology/approach: The microanalysis was investigated by the Energy-dispersive X-ray spectroscopy EDS. The changes in surface topography was observed by the atomic force microscope AFM XE-100 and scanning electron microscope SEM. The results of roughness was obtained by the software XEI Park Systems. The measurement of thickness and dispersion of refractive index was performed using SE800 PV spectroscopic ellipsometer. The optical reflection was investigated by the spectrometer UV/VIS. Findings: Results and their analysis allow to conclude that the atomic layer deposition method enables uniform coating of smooth and complicated shapes surfaces. The thin film thickness depends only on the number of cycles, so that can be easily control the thickness of the material. Practical implications: Knowledge about the ALD Al2O3 optical parameters and the possibility to obtaining a uniform thin films show that the previously named material has a big potential in photovoltaic application. Originality/value: The paper presents some researches of aluminium trioxide thin films deposited by atomic layer deposition method on monocrystalline silicon.

Efektywne współdziałanie elementów fasady szklanej

Świat Szkła

2012

R. 17, nr 9

18-20