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Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering

Wicher B., Chodun R., Nowakowska-Langier K., Okrasa S., Król K., Minikayev R., Strzelecki G., Zdunek K.

Archives of Metallurgy and Materials

2018

Vol. 63, iss. 3

1339--1344

This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.