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1

Review on Strain Monitoring of Aircraft : Using Optical Fibre Sensor

Murthy Monica N., Kakade Priyanka Desai

International Journal of Electronics and Telecommunications

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2022

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Vol. 68. No. 3

625--634

EN

Structural health monitoring of aircraft assures safety, integrity and reduces cost-related concerns by reducing the number of times maintenance is required. Under aerodynamic loading, aircraft is subjected to strain, in turn causing damage and breakdown. This paper presents a review of experimental works, which focuses on monitoring strain of various parts of aircraft using optical fibre sensors. In addition, this paper presents a discussion and review on different types of optical fibre sensors used for structural health monitoring (SHM) of aircraft. However, the focus of this paper is on fibre bragg gratings (FBGs) for strain monitoring. Here, FBGs are discussed in detail because they have proved to be most viable and assuring technology in this field. In most cases of strain monitoring, load conditioning and management employs finite element method (FEM). However, more effort is still required in finding the accurate positions in real time where the sensors can be placed in the structure and responds under complex deformation.

2

Slowing of optical signals in generalized Cantor structure

Ben Ali N., Yusoff W., Trabelsi Y., Kanzari M.

Optica Applicata

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2018

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Vol. 48, nr 1

65--73

EN

In this paper, a simulation study of the slowing optical signals in generalized Cantor structure is proposed. The materials constituting the structure’s layers are SiO2 and the TiO2. The slowing down factor is determined using the transfer matrix method whose purpose is to study the slowing of light. We show that the slowing down factor value depends on the generalized Cantor parameters (a, b and c) and the reference wavelength λ0. These parameters are optimized to better slowing the optical signals, minimize the number and the thickness of structure’s layers. At the end of the paper we compare our results with previous research work.

3

A note on optical materials for photolithography applications

Jain A., Roszkiewicz A., Nasalski W.

IPPT Reports on Fundamental Technological Research

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2018

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nr 3

1--41

EN

Optical lithography or photolithography is well-established optical tool for patterning of substrates, layers or photonic crystals. Therefore, the materials involved in these processes play an important role, especially for the possibility of their further advancements and optimisation. In this review article, we discuss on the role and significance of photoresist materials from various perspectives like their performance in photonic applications and their dependence on various physical and chemical parameters. Further, several emerging now two-dimensional materials like graphene has also been discussed from photonic point of view. We aim to give a short overview of recent developments of such materials in this field.

PL

Fotolitografia jest dobrze znanym procesem pozwalającym na tworzenie wzorów na podłożach, warstwach czy kryształach fotonicznych. W związku z tym materiały wykorzystywane w tym procesie pełnią istotną rolę, zwłaszcza ze względu na dalszy możliwy rozwój dziedziny oraz optymalizację procesu. W tym artykule przeglądowym omawiamy rolę i znaczenie fotorezystu z różnych perspektyw, np. jego wydajność w zastosowaniach fotonicznych czy zależność od różnych parametrów fizycznych i chemicznych. Ponadto, omawiamy wiele powstających obecnie dwuwymiarowych materiałów, jak grafen, z punktu widzenia fotoniki. Naszym celem jest przedstawienie krótkiego przeglądu ostatnich osiągnięć w dziedzinie tego typu materiałów wykorzystywanych w fotolitografii.

4

Przegląd samoorganizujących się struktur eutektycznych metal-tlenek dla zastosowań w fotonice

Sadecka K., Gajc M., Pawlak D. A.

Materiały Elektroniczne

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2009

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T. 37, nr 3

3-12

PL

Praca przedstawia przegląd literaturowy dotyczący układów eutektycznych metal-tlenek. Analiza prac różnych autorów pozwoliła wybrać materiały eutektyczne (HfO2-W stabilizowane przez Y2O3 oraz Cr2O3-Mo), które wykazują odpowiednią strukturę do zastosowań w nowoczesnej fotonice (metamateriały, ujemne załamanie światła) oraz których warunki otrzymywania pozwalają na otrzymanie ich za pomocą dostępnych metod krystalizacji kierunkowej. Wybrane systemy eutektyczne mogą być odpowiednie dla zastosowań w fotonice i możliwe do zrealizowania za pomocą urządzeń dostępnych w Laboratorium im. Jana Czochralskiego w ITME

EN

This paper is a review on self-organized metal--metal oxide eutectic microstructures. These kinds of materials are very promising for novel photonics. Based on literature survey two eutectic materials have been proposed as suitable from the structural and manufacturing point of view. The selected materials are: HfO2-W stabilized by Y2O3 and Cr2O3-Mo. Selected eutectic systems can be used in photonics, and can be possibly made with equipment installed in Jan Czochralski Laboratory in the Institute of Electronic Materials Technology.

5

Negative refraction of photonic and polaritonic waves in periodic structures

Kempa K., Rose A.

Bulletin of the Polish Academy of Sciences. Technical Sciences

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2009

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Vol. 57, nr 1

35-39

EN

Negative refraction can be achieved in photonic crystals. We briefly summarize recent studies in this field, and show that such effects are also possible in polaritonic and plasmonic structures, such as the dipole crystal. We propose a practical realization of this crystal, a periodic lattice of dielectric spheres. We study its mode structure, and preliminary results demonstrate the negative refraction on a polaritonic band.

6

Fotonika mikrofalowa

Galwas B. A.

Spektrum

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2008

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nr 9

XXII-XXVII

PL

Opisano najważniejsze procesy i układy, w których wykorzystano wzajemne oddziaływanie sygnałów pasma mikrofalowego i fal milimetrowych z sygnałami pasm optycznych. Przedstawiono podstawowe techniki transmisji sygnałów mikrofalowych łączami optycznymi oraz sposoby generacji sygnałów mikrofalowych wykorzystujące techniki fotoniki. Przedstawiono wybrane techniki wykorzystania sygnałów optycznych do sterowania układami mikrofalowymi. Artykuł kończy prezentacja wybranych systemów radiowych wykorzystujących transmisję łączami optycznymi.

EN

In this paper we present most important phenomena and systems where microwave and optical signals interact with each other. We also present elementary techniques of microwave signal transmission via optical links, optical generation of microwaves and also optical control of microwave devices. Finally a review of selected radio systems that use optical transmission is presented.

7

Broadside coupled stripline with double-side UC-PBG structure

Meissner P., Kitliński M.

Journal of Telecommunications and Information Technology

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2005

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nr 2

61-64

EN

A stripline waveguide with double-side UC-PBG pattern is considered. To verify usefulness of the stripline structure with UC-PBG a 3 dB coupler has been designed and fabricated. Reduction of the coupler size (due to slow wave effect) has been predicted and observed. Numerical and experimental investigation confirmed enhanced backward coupling phenomena.

8

Plasmon polaritons in metal nanostructures : the optoelectronic route to nanotechnology

Salerno M., Krenn R. R., Lamprecht B., Schider G., Ditlbacher H., Felidj N., Leitner A., Aussenegg F. R.

Opto-Electronics Review

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2002

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Vol. 10, No. 3

217-224

EN

In the light of recent advances in subwavelength optics, the development of optical nanodevices is nowadays conceivable. Among the best candidates to act as the elementary components of such devices are nanoscale structures of noble metals. These materials are capable to sustain resonant electron oscillations (plasmons). This phenomenon gives rise to a spectrally selective optical response and a local field enhancement which can be used in the context of nano-optics. Furthermore, it allows to transduce the optical signals into electrical ones (and vice wersa). Here, we demonstrate an optical nanodevice based on plasmon resonances in gold nanostructures. The adequate metal structures were produced by electron-beam-lithography. The basic operating functions of the device, namely signal processing on the nanoscale and its interfacing on the microscale, were experimentally observed in the optical near-field by photon scanning tunneling microscopy. Furthermore, as a numerical method for validation of the near-field observations the Green's Dyadic Technique is pointed out.