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Technical B-H Saturation Magnetization Curve Models for SPICE, FEM and MoM Simulations

Szewczyk R.

Journal of Automation Mobile Robotics and Intelligent Systems

2016

Vol. 10, No. 2

3--7

Recent development of SPICE, FEM and MoM software often requires the fast and reliable description of BH saturation magnetization curve. In spite of the fact that physical models of BH saturation curve are very sophisticated, for technical purposes, such curve may be modelled by simplified equations. Paper presents the quantitative assessment of the quality of four technical models of BH saturation magnetization curve performed for four modern magnetic materials: constructional corrosion resistant steel, Mn-Zn ferrite, amorphous alloy with perpendicular anisotropy as well as Finemet-type nanocrystalline magnetic material. Presented results confirm reliability of the model as well as indicate that high-speed calculation may be done using arctangent function.

Micromagnetic properties of Co/Pt multilayers deposited on different buffer layers

Czapkiewicz M, Kanak J, Stobiecki T, Kachel M, Żołądź M, Sveklo I, Maziewski A, Van-Dijken S

Materials Science Poland

2008

Vol. 26, No. 4

839--848

A study on the buffer layer dependence of the film texture, surface roughness, and magnetization reversal process in Co/Pt multilayers prepared by dc magnetron sputtering is presented. Oxidized Si(100) wafer was covered with four different buffers: (A) 10 nm Cu, (B) 5 nm Ta/10 nm Cu, (C) 5 nm Ta/10 nm Cu/5 nm Ta, and (D) 5 nm Ta/10 nm Cu/5 nm Ta/10 nm Cu. The growth of [2 nm Pt/0.5 nm Co]×5/2 nm Pt on top of these buffer layers results in a large variation in the fcc (111) Co/Pt texture and surface morphology. All films have the perpendicular magnetic anisotropy but magnetization reversal process, studied by the magnetooptic Kerr effect (MOKE) and magnetic force spectroscopy (MFM), strongly depends on the buffer used. Observation of magnetic domains evolution under a MOKE microscope allows one to calculate from magnetization relaxation curves average dispersion of energy barriers of the thermal activated magnetization switching process. The application of MFM in external magnetic field allows one to follow the dynamics of direct and indirect magnetization switching procesess up to submicrometer scale.

Effects of an external magnetic field on the perpendicular magnetic anisotropy of electrodeposited micro-patterned arrays

Jeung W. Y., Choi D. H., Lee K. H.

Materials Science

2003

Vol. 21, No. 1

147-154

We have investigated effects of an external magnetic field on PMA (perpendicular magnetic anisotropy) for electrodeposited continuous films and micro-patterned arrays. For continuous films, external magnetic field gave rise to a highly aligned grain structure with a PMA. Our results indicated that the effect of applied magnetic field is apparent only under specific current density. XRD patterns showed that electrodeposited continuous Co films consist of hexagonal cobalt only and have strong texture for grains with c-axis lying perpendicular to the film plane. The patterned arrays were fabricated by UV-LIGA process, and PMA was modified by changing the aspect ratio of patterned arrays. Our results suggest that there is a critical aspect ratio at which PMA dominates in-plane anisotropy. For the patterned arrays, however, an external magnetic field was little effective due to large concentration polarization.