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Content available remote Electrical properties mono- and polycrystalline silicon solar cells
EN
Purpose: The goal of this article was to compare the properties of mono- and polycrystalline silicon solar cells. It was based on measurements performed of current-voltage characteristics and calculated parameters using mathematical formulas. Design/methodology/approach: Light and dark current-voltage characteristics of solar cells were measured using a solar simulator PV Test Solutions company SS150AAA model. The measurements were performed under standard conditions (Pin = 1000 W/m², AM1.5G spectrum, T = 25°C). The basic characteristic of the solar cells were determined using the software SolarLab and calculated using mathematical formulas. Findings: Results and their analysis allow to conclude that measurements of current-voltage characteristics enable characterization of the basic parameters of solar cells. Can give important information about the property of prepared metallic contacts on the solar cells. Practical implications: Knowledge about the current-voltage characteristics of solar cells and their basic parameters enables the assessment of the quality of their production and the improvement. Originality/value: The paper presents some researches of the basic parameters of mono- and polycrystalline solar cells determining the current-voltage characteristics.
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Content available remote Al2O3 antireflection coatings for silicon solar cells
EN
Purpose: The aim of this paper was to investigate changes in surface morphology and optical properties of thin films of Al2O3. Thin films were prepared using atomic layer deposition (ALD) method. Design/methodology/approach: The microanalysis was investigated by the Energy-dispersive X-ray spectroscopy EDS. The changes in surface topography was observed by the atomic force microscope AFM XE-100 and scanning electron microscope SEM. The results of roughness was obtained by the software XEI Park Systems. The measurement of thickness and dispersion of refractive index was performed using SE800 PV spectroscopic ellipsometer. The optical reflection was investigated by the spectrometer UV/VIS. Findings: Results and their analysis allow to conclude that the atomic layer deposition method enables uniform coating of smooth and complicated shapes surfaces. The thin film thickness depends only on the number of cycles, so that can be easily control the thickness of the material. Practical implications: Knowledge about the ALD Al2O3 optical parameters and the possibility to obtaining a uniform thin films show that the previously named material has a big potential in photovoltaic application. Originality/value: The paper presents some researches of aluminium trioxide thin films deposited by atomic layer deposition method on monocrystalline silicon.
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