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Application of AFM technique for creation of patterns in nanoscale

Ramiączek-Krasowska M., Szyszka A., Stafiniak A., Paszkiewicz R., Paszkiewicz B., Tłaczała M.

Optica Applicata

2011

Vol. 41, nr 2

307--314

The lithography is a main technology process which determines the properties of semiconductor devices. The resolution of optical lithography is insufficient for creation of submicrometer patterns, like, e.g., gate electrode in HEMT transistors. Thus, a novel technique that uses AFM technique and common photolithography was proposed. In the paper, the results of nanoscratching lithography were presented and discussed. Also the transmission and root mean square of thin metal films measurements were summarized.