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XeCl excimer laser with three- and four-component mixture of active gases

Iwanejko L., Pokora L.

Journal of Technical Physics

1998

Vol. 39, no 2

189-197

Selected results of investigations of a XeCl excimer laser employing a new type (four-component) of mixture of gases, He-Kr:He-HCl, are presented. The mixture includes, instead of Xe, a mixture of not-separated Kr and Xe gases, much less expensive than pure xenon. A comparison of durations and energies of pulsess generated in the XeCl excimer laser using three- or four-component gaseous active medium (He-He-HCl or He-Kr:He-HCl) is made. The investigations have been carried out with the use of a laser system with UV preionization and self-sustained pumping discharge.