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1 Opto-Electronics Review

1 2001

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UHV plasma enhanced CVD system for preparation of new generation amorphous silicon based efficient solar cells

Jonas S., Rava P., Stapinski T., Walasek E.

Opto-Electronics Review

2001

Vol. 9, No. 1

91-95

Plasma enhanced chemical vapour deposition (PECVD) is used in the deposition of various thin films such as amorphous silicon, nitrides, oxides and diamond-like carbon. The authors succeeded in preparation of photovoltaic intrinsic a-Si : H with density of 10¹⁶ cm⁻³ and high photocontuctivity gain. These films are the constituents of homojunction p-i-n solar cells or heterojunction type with silicon-carbon window layer of efficiency over 10%. The microwave plasma chemical vapour deposition (MWCVD) seems to be a promising method for the deposition of passivation layers.