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1 2011

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Micromirrors inclined at 45° towards Si substrates fabricated by anisotropic etching

Zubel I., Rola K.

Optica Applicata

2011

Vol. 41, nr 2

423--430

A study of manufacturing micromirrors inclined at 45° towards silicon substrate has been presented in this paper. The micromirrors can be formed by {100} or {110} sidewall planes etched in (110) or (100) Si substrates in alkaline solutions. The smoothness of the surface and etch rate anisotropy are crucial parameters of fabricated structures. The research focused on Si(100) wafers etched either in KOH solutions with alcohol additives or in low concentrated TMAH solutions with surfactant addition and on Si(110) wafers etched in pure highly concentrated KOH or TMAH solutions. The examination showed difficulty of fabrication of the structures with smooth sidewalls and with appropriate shape simultaneously. At the end of the paper, the structure for bringing close and parallel of two optical beams has been proposed.