Wyniki wyszukiwania - BazTech

1

Z poligrafią przez wieki. Drukowanie offsetowe

Khadzhynova Svitlana, Jakucewicz Stefan

Przegląd Papierniczy

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2021

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R. 77, nr 10

536--540

PL

Drukowanie offsetowe jest techniką pochodną drukowania płaskiego, którego poprzednikiem była litografia (z greckiego lithos – kamień, grapfo – pisać) – inaczej drukowanie z kamienia litograficznego.

2

Justification of the most rational method for the nanostructures synthesis on the semiconductors surface

Suchikova Y., Vambol S., Vambol V., Mozaffari N., Mozaffari N.

Journal of Achievements in Materials and Manufacturing Engineering

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2019

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Vol. 92, nr 1-2

19--28

EN

Purpose: of this paper is to justification the most rational method for the nanostructures synthesis on the semiconductors surface, which is capable of providing high quality synthesized nanostructures at low cost and ease of the process. Design/methodology/approach: The choice of the optimal method of synthesis was carried out using the hierarchy analysis method, which is implemented by decomposing the problem into more simple parts and further processing judgments at each hierarchical level using pair comparisons. Findings: The article describes the main methods of synthesis of nanostructures, presents their advantages and disadvantages. The methods were evaluated by such criteria as: environmental friendliness, efficiency, stages number of the technological process, complexity, resources expenditure and time and effectiveness. Using the hierarchy analysis method, has been established that electrochemical etching is the most important alternative, and when choosing a nanostructures synthesis method on the semiconductors surface, this method should be preferred. Such studies are necessary for industrial serial production of nanostructures and allow reducing expenses at the realization of the problem of synthesis of qualitative samples. Research limitations/implications: In this research, the hierarchy analysis method was used only to select a rational method for synthesizing nanostructures on the semiconductors surface. However, this research needs to be developed with respect to establishing a correlation between the synthesis conditions and the nanostructures acquired properties. Practical implications: First, was been established that the optimal method for the nanostructures synthesis on the semiconductors surface is electrochemical etching, and not lithographic or chemical method. This allowed the theoretical and empirical point of view to justify the choice of the nanostructures synthesis method in the industrial production conditions. Secondly, the presented method can be applied to the synthesis method choice of other nanostructures types, which is necessary in conditions of resources exhaustion and high raw materials cost. Originality/value: In the article, for the first time, the choice of the nanostructures synthesis method on the semiconductors surface is presented using of paired comparisons of criteria and available alternatives. The article will be useful to engineers involved in the nanostructures synthesis, researchers and scientists, as well as students studying in the field of "nanotechnology".

3

Four-channel multiplexer on surface plasmon polaritons development and research

Nevinskyі D. V., Zakalyk L. I., Lebid S. Y., Korzh H. I., Pavlysh V. A.

Challenges of Modern Technology

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2016

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Vol. 7, no. 1

7--11

EN

Simulation of the surface plasmon polariton (SPP) distribution in the 10 μm long four-channel multiplexer is conducted in present paper. The excitation of the SPP was done using the 632.8 nm pulse laser with 50 fs pulse duration. The simulation processes of the SPP propagation in the fourchannel multiplexer were performed for the latter switched as a splitter as an adder. Though the obtained signal strength is low due to ohmic losses and signal reflections in the middle of the waveguide it is possible to registrate it. The detailed procedure of waveguides preparation, analysis and registration of SPP propagation is described in the paper. For the proposed model verification the two-channel 20 μm long splitter was formed by optical projection lithography. Studies have shown that the SPP is distributed throughout the whole structure of the 20 μm long two-channel splitter with a partial extinction due to ohmic losses.

4

Wytwarzanie struktur poprzez osadzanie powierzchniowe

Furyk K., Wyszyński D.

Mechanik

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2014

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R. 87, nr 1

48--51

PL

Na podstawie literatury przedstawiono wybrane metody osadzania powierzchniowego, takie jak: litografia, fizyczne osadzanie z fazy gazowej (PVD – Physical Vapor Deposition), chemiczne osadzanie z fazy gazowej (CVD – Chemical Vapor Deposition), osadzanie elektrochemiczne oraz metody wspomagane laserem, np. bezprądowe osadzanie chemiczne wspomagane laserowo (LEEP – Laser-Enhanced Electroless Plating) i chemiczne osadzanie z fazy gazowej wspomagane wiązką laserową (LCVD – Laser Chemical Vapor Deposition).

EN

On the basis of the literature shows some surface deposition method such as lithography, physical vapor deposition (PVD - Physical Vapor Deposition), chemical vapor deposition (CVD - Chemical Vapor Deposition), electrochemical deposition, and laser-assisted methods, for example. Electroless Laser-assisted chemical deposition (LEEP - Enhanced Laser electroless plating), and chemical vapor deposition assisted laser beam (LCVD - Laser chemical vapor deposition).

5

Procesy wytwarzania periodycznych struktur o wymiarach nanometrowych w GaN przy użyciu technik litografii NIL

Ekielski M., Juchniewcz M., Piotrowska A.

Przegląd Elektrotechniczny

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2013

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R. 89, nr 10

57-60

PL

Omówiono podstawy technik litografii z wykorzystaniem procesu nanostemplowania (NIL), dokonano przeglądu materiałów do wytwarzania stempli oraz rezystów do kształtowania wzorów, przedyskutowano najważniejsze problemy występujące przy implementacji procesów NIL w praktyce. Zaprezentowano wyniki prac własnych nad wytwarzaniem periodycznych nanostruktur GaN o wymiarach krytycznych od 50 do 300 nm przy pomocy technik Th-NIL oraz UV-NIL z użyciem replik polimerowych oraz trawienia ICP w plazmie BCl3/Cl2.

EN

Fundamentals of Nanoimprint Lithography (NIL) have been presented, stamp materials, resists and fabrication processes have been overviewed, main problems encountered in implementing NIL in practice have been discussed. Recent results on fabrication periodic GaN nanostructures with critical dimensions ranging from 50 to 300 nm by using Th-NIL and UV-NIL combined with polymer replicas and ICP etching in BCl3/Cl2 plasma have been presented.

6

Jak powstają te maleństwa?

Sulima R.

Nowa Elektrotechnika

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2008

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nr 5 (45)

1--4

7

Kimeryd Garbu Wójczańsko-Pińczowskiego: przegląd i rewizja odsłonięć

Górka M.

Volumina Jurassica

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2003

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Vol. 1, no. 1

93-98