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Fabrication of photonic crystal structures by laser lithography

Mizeikis V., Seet K. K., Juodkazis S., Misawa H.

Journal of Automation Mobile Robotics and Intelligent Systems

2009

Vol. 3, No. 4

99-101

Using femtosecond laser lithography technique, we have fabricated 3D PhC structures having woodpile and spiral architectures in photoresists, and investigated their photonic properties. The fabricated structures exhibit good structural quality, evidenced by long-range periodicity and absence of deformations, and photonic stop-gaps at nearinfrared and infrared wavelengths, evidenced by spectral bands of high reflectivity. These structures can be used as templates for further enhancement by infiltration of metals or high refractive index materials, such as Si.

Linewidth control by overexposure in laser lithography

Liang Y., Yang G.

Optica Applicata

2008

Vol. 38, nr 2

399-404

In micro-electronic and micro-optical manufacturing, especially in the fabrication of linewidth- -variation-sensitive devices, we sometimes care getting stable or precise linewidth rather than creating a thinner line. In laser lithography, the energy distribution of a focused laser spot is of Gaussian form, and the modification of an exposure dose or exposure threshold will cause linewidth variation. If the peak of energy distribution of a laser spot is a little higher than the exposure threshold of a photoresist layer, the produced linewidth may be small but unstable, and if the peak is considerably higher than the threshold, in other words in the case of overexposure, the linewidth will be relatively stable. The test was carried out in a polar laser lithographic system through a continuously changing exposure dose. The experimental result shows that the dose-induced linewidth variation velocity is different under a variant exposure dose. The higher the exposure dose, the lower the linewidth variation velocity.