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Recent advancements in the “water-window” microscopy with laser-plasma SXR source based on a double stream gas-puff target

Wachulak P. W.

Opto-Electronics Review

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2016

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Vol. 24, No. 3

144--154

EN

An overview of our recent developments, regarding “water−window” soft X−ray (SXR) microscopy based on a laser−plasma double stream gas puff target sources is presented. The work, presented herein, describes two approaches to SXR microscopy. The first one is a low spatial resolution, achromatic SXR microscopy, employing Wolter type−I objective. The second one is a nanometer spatial resolution SXR microscopy, with the use of a Fresnel zone plate objective, for imaging various objects with quasimonochromatic light, emitted from a double stream gas puff target based short wavelength source. The developments regarding both systems are presented, as well as the possible applications, for which the SXR microscope was already employed. Such compact, table−top size, laboratory type microscopy setups may be employed in the near future for complementary−like studies to other, often used, microscopy techniques.

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Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target

Rakowski R., Bartnik A., Fiedorowicz H., Jarocki R., Kostecki J., Krzywinski J., Mikolajczyk J., Pina L., Ryc L., Szczurek M., Ticha H., Wachulak P.

Optica Applicata

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2006

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Vol. 36, nr 4

s. 593--600

EN

In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry.

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X-ray laser emission from a laser-irradiated gas puff target

Fiedorowicz H., Bartnik A.

Bulletin of the Polish Academy of Sciences. Technical Sciences

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2005

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Vol. 53, nr 2

103-111

EN

The paper describes the research on soft X-ray lasers with an active medium created using a gas puff target irradiated with high-intensity laser pulses. The gas puff target in a form of an elongated gas sheet is produced by pulsed injection of gas through a slit nozzle using a high-pressure electromagnetic valve. The method of generation of soft X-ray lasers using a laser-irradiated gas puff target has been developed at the Institute of Optoelectronics. The collaborative experiments were performed at various laser laboratories using high-intensity laser systems to irradiate the gas puff target and pump the X-ray laser active medium. Results of these experiments are presented and discussed. Works aimed at increasing the efficiency of X-ray lasers using a longitudinally irradiated gas puff target are also reviewed.

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Femtosecond-pulse-driven soft X-ray laser studies using a gas puff target irradiated with a Ti:sapphire laser.

Fiedorowicz H., Bartnik A., Szczurek M., Cang Hee Nam, Mocek T., Hyun Joon Shin, Yong Ho Cha, Dong Gun Lee, Kyung Han Hong Kyung Han

Optica Applicata

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2000

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Vol. 30, nr 1

93-102

EN

Preliminary experimental investigations on soft X-ray lasers based on optical field ionization of gases with an ultrashort-pulse terawatt laser system are presented. Both recombination and collisional soft X-ray laser schemes have been studied. An elongated gas puff target formed by pulsed injection of a small amount of gas from a high-pressure electromagnetic valve through a nozzle in a form of a slit was used to create an X-ray laser active medium. The target was irradiated with laser pulses from a 20-fs, 50-mJ Ti:sapphire (Ti:S) laser system. Soft X-ray spectra from nitrogen, oxygen, and xenon targets are presented and discussed.