Purpose: The objective of this article was to compare the surface morphology and structure of thin films deposited by screen printing and sputtering (PVD) methods. Design/methodology/approach: The morphology of the surface of the platinum thin films was performed using a scanning electron microscope Zeiss Supra 35. The detailed surface topography studies were made using an atomic force microscope XE-100 Park systems company. Roughness parameters were calculated using the software XEI. The whole study was complemented by X-ray crystallography. Findings: Results and their analysis show that the physical vapour deposition method allows the deposition of thin films with a better quality than the screen printing method. Practical implications: The platinum thin films are good potential material for electronics, optoelectronics and photovoltaics. Originality/value: The paper presents results of investigations on platinum thin films prepared with screen printing and sputtering (PVD) methods on a FTO glass substrate.
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