The influence of the hydrogenated silicon nitride coatings (SiN x:H) formed by the plasma enhanced chemical vapour deposition on the electrical activity of interfaces of the grains of mc-Si solar cell was examined. Passivation effects were evaluated by the measurements of light-beam-induced current scan maps. It was found that the SiNx:H layer obtained under optimized conditions significantly improves local photocurrent at the grain boundaries. The electrical parameters of mc-Si solar cells with and without the SiNx:H layers were compared.
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In this elaboration have been presented the tribology tests of layers have been obtained by chemical vapour deposition. The tests surrendered layers contained: carbon, hydrogen and nitrogen (a-C:H - an amorphous hydrogenated carbon, a-C:H:N - an amorphous hydrogenated nitrogenated carbon). The tribology tests contained the abrasive wear and coefficient of friction. Peculiarly occupy oneself with layers a-C:H:N because this layers are in initial phase of tests. These layers have been made in special apparatus of Italian Firm Electrorava. The trihology tests conducted on Four-Ball Wear Tester Brown/G. E. Modification of Firm Roxana Machine Works USA. For the purpose of work was analysis of coefficient of friction and designation the abrasive wear of coating have been obtained by chemical vapour deposition.
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