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The PS-PVD method - formation of columnar TBCs on CMSX-4 superalloy

Góral M., Kotowski S., Drajewicz M., Sieniawski J.

Journal of Achievements in Materials and Manufacturing Engineering

2012

Vol. 55, nr 2

907--911

Purpose: The new plasma spraying method. Design/methodology/approach: The single crystal CMSX-4 nickel alloy was used as base material. The diffusion aluminide layer was deposited during the CVD process and was used as bond-coat. The zirconium oxide stabilized by yttrium oxide was utilized as the deposition material. Findings: It was proved, that there is a possibility of obtaining the ceramic layer using the PS-PVD process. Research limitations/implications: The thickness analysis and the chemical composition analysis by light and scanning electron microscopy were performed. Practical implications: This process can be used in aerospace industry to form oxidation resistant coatings. Originality/value: In article Plasma Spraying Physical Vapour Deposition Process was described.