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EN
Preliminary investigations on preparation, optical and electrical properties of superlattice structures composed of twin layers of an amorphous semiconductor (a-S) and an amorphous insulator (a-l) were performed. These structures were fabricated in an audio-frequency three-electrode plasma reactor as hydrogenated carbon-germanium films (a-GexCy:H) using as a precursor source the mixture of tetramethylgermanium and argon. The type of deposited material (a-l or a-S) was controlled by the coupling capacitance of the system. It has been proved, by means of ellipsometric measurements, that interfaces between a-l and a-S layers are very sharp and the superlattice structure is well defined. Both „blue shift" of the optical gap and changes of electrical conductivity were observed as a result of the superlattice geometry variation. It is, however, doubtful if these phenomena are connected with the quantum size effects.
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