Ograniczanie wyników
Preferencje help
Widoczny [Schowaj] Abstrakt
Liczba wyników
Powiadomienia systemowe
  • Sesja wygasła!

Znaleziono wyników: 1

Liczba wyników na stronie
first rewind previous Strona / 1 next fast forward last
Wyniki wyszukiwania
Wyszukiwano:
w słowach kluczowych:  atomic deuterium adsorption
help Sortuj według:

help Ogranicz wyniki do:
first rewind previous Strona / 1 next fast forward last
EN
Interaction of atomic deuterium, thermally generated on hot tungsten filament with thin Au polycrystalline film was studied. The surface topography, preferential crystallographic orientation and real area of the films were determined on the basis of AFM, XRD and BET data. The experiments with deuterium were carried out measuring the change of the adsorbent resistance _R during D atoms adsorption under isothermal conditions (78 or 87 K). It has been found that the rate of adsorption occurs according to Eley-Rideal (ER) model. One adsorption state exists, characterized by sticking probability S0 = 0.25 and ER recombination probability _ = 0.22. Measurements of the resistance changes _R of thin gold films with deuterium deposit caused by an increase of temperature were applied to study desorption phenomena. Differentiation of delta R against temperature T in the course of thermal desorption reveals the existance of two desorption states with maxima of desorption rates around 120 and 170 K. We suggest that the first one corresponds to desorption of (D-D) ad-dimers, and the second one to associative desorption due to recombination of D ad-atoms. Thus the adsorption and desorption states of atomic deuterium on thin gold films differ.
first rewind previous Strona / 1 next fast forward last
JavaScript jest wyłączony w Twojej przeglądarce internetowej. Włącz go, a następnie odśwież stronę, aby móc w pełni z niej korzystać.