Wyniki wyszukiwania - BazTech

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Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation

Čolović Božana, Kisić Danilo, Jokanović Bojan, Rakočević Zlatko, Nasov Ilija, Trajkovska Petkoska Anka, Jokanović Vukoman

Materials Science Poland

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2019

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Vol. 37, No. 2

173--181

EN

Thin films of titanium oxides, titanium oxynitrides and titanium nitrides were deposited on glass substrates by the methods of direct current (DC) and pulsed magnetron sputtering and cathodic arc evaporation. Phase analysis of the deposited films by X-ray diffraction (XRD) and Fourier-transform infrared spectroscopy (FT-IR) showed the presence of phases with various Ti oxidative states, which indicated a high concentration of oxygen vacancies. The films morphology was investigated by scanning electron microscopy (SEM). Investigations of the films wettability, either with water or ethylene glycol, showed that it depends directly on the concentration of oxygen vacancies. The wettability mechanism was particularly discussed.

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Optymalizacja twardości powłoki węglika chromu CrxCy metodą Taguchiego

Ruta R., Trzos M., Smolik J.

Inżynieria Powierzchni

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2011

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nr 3

53-59

PL

W artykule podano wyniki optymalizacji twardości powłoki CrxCy nakładanej metodą odparowania łukowego. Do rozwiązania problemu zastosowano metodę Taguchiego, z powodzeniem stosowaną do optymalizacji procesów technologicznych. W ramach optymalizacji właściwości powłoki CrxCy, wyznaczono wartości parametrów procesu (ciśnienie, napięcie, natężenie prądu wyładowania łukowego oraz prędkość przepływu atmosfery procesowej), przy których nakładana powłoka charakteryzowała się odpowiednio: największą twardością, najmniejszą twardością i twardością o zadanej wartości. Uzyskane wyniki zostały zweryfikowane z wykorzystaniem specjalnie zaprojektowanych eksperymentów, w których procesy osadzania powłoki CrxCy prowadzono przyjmując wartości parametrów wyznaczone w wyniku optymalizacji. Przeprowadzona weryfikacja potwierdziła przydatność metody Taguchiego do planowania parametrów procesu osadzania powłok o zadanych właściwościach.

EN

The article presents the results of hardness optimization of CrxCy coating applied with the use of arc-vaporation method. Taguchi method has been used for hardness optimization as the method which succeed in the area of technological processes. Within the scope of CrxCy coating’s properties optimization, the process parameters (pressure, voltage, current intensity of arc discharge and flow velocity) were defined for following coatings: the ones of maximum hardness, the ones of minimum hardness and the ones of chosen hardness value. The research results were verified in additional experiments that encompassed the CrxCy coating arc-evaporation with the process parameters that were identified with the use of optimization method. The verification proved that Taguchi method is useful for optimization of co ating properties deposited with arc-evaporation.

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Influence of the vacuum-arc source configuration and arc discharge parameters on the evolution and location of arc spots on the cathode surface

Walkowicz J., Smolik J., Słomka Z., Kułakowska-Pawlak B., Żyrnicki W.

Journal of Achievements in Materials and Manufacturing Engineering

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2009

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Vol. 37, nr 2

719-725

EN

Purpose: The paper presents investigations of the evolution, structure and location of arc spots on the cathode frontal surfaces of two types of industrial arc sources. Design/methodology/approach: The temporal behaviour of cathode spots was recorded with the use of a fast CCD camera. The experiments were performed at four values of arc current, nine compositions of the process atmosphere N2+C2H2 and three pressure ranges of the process atmosphere. Findings: The analysis of the recorded pictures revealed the fine structure of the arc discharge for the investigated range of process conditions. Both temporal and spatial behaviour of cathode spots were different for both investigated arc sources. The correspondence between radial distributions of the cathode spots on the cathode surface and radial distribution of plasma flow elements analysed in the volume of the vacuum chamber was revealed. Research limitations/implications: The paper show experimental methodology that can be used for the research of the specificity of cathode spots movement on the cathodes made from different materials. Originality/value: The originality of the research presented in the paper consists in assigning overall correlation between vacuum-arc source configuration and parameters of vacuum-arc discharge – on the one hand, and space-time behaviour of the arc spots during their movement on the circular cathode surface and radial distribution of excited and ionized atoms of the cathode material in the deposition chamber – on the other.

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Correlation between spatial distribution of the components of reactive plasma flow and the stoichiometry and defectiveness of deposited coatings

Walkowicz J., Smolik J., Brudnias R., Kułakowska-Pawlak B., Żyrnicki W.

Journal of Achievements in Materials and Manufacturing Engineering

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2009

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Vol. 37, nr 2

712-718

EN

Purpose: The subject of the presented research was reactive plasma generated by circular vacuum-arc sources used for deposition of thin hard coatings. Design/methodology/approach: Experimental investigations on spatial distribution of ionized and excited plasma components were performed with the use of the optical emission spectroscopy. Quantitative analysis of microdroplets distribution was carried out using measuring optical microscope supplied with the numerical image analysis system. Findings: Based on the obtained radial distributions of volatile and condensed components the general picture of plasma flow emitted by a single circular arc source was reconstructed. Radial distributions of analysed emitting elements and analysed fractions of microdroplets showed layered structures that depended on the discharge conditions. Research limitations/implications: The spectral method used for the reconstruction of concentration distributions of ionised and excited plasma components generated by a single circular arc source could not be used for reconstruction of such distributions in the vacuum chamber of the industrial device. Originality/value: The carried out investigations showed that the differences in spatial distributions of plasma active elements determine the uniformity of crystallization conditions in vacuum-arc deposition processes performed in large-scale multi-source industrial devices.