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1

Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target

Tsai Du-Cheng, Chen Erh-Chiang, Huang Yen-Lin, Shieu Fuh-Sheng, Chang Zue-Chin

Materials Science Poland

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2023

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Vol. 41, No. 1

191--201

EN

The aim of this study is to explore the structural and optoelectronic properties of Cu-Cr-O thin films when processed by the magnetron sputtering method using a single equimolar CuCr alloy target. These films were then post-annealed in a controlled Ar atmosphere at 500°C to 800°C for 2 h. The as-deposited Cu-Cr-O thin film consisted of an amorphous phase and exhibited extremely poor optoelectronic properties. After annealing was conducted at 500°C, monoclinic CuO and spinel CuCr2O4 phases were simultaneously formed in the film. Upon increasing the annealing temperature to 600°C, the CuCr2O4 phase reacted completely with the CuO phase and transformed into the delafossite CuCrO2 phase, possessing optimal optoelectronic performance. It has an electrical resistivity of 41 Ω-cm and a light transmittance of 49.5%, making it suitable for p-type transparent conducting electrodes. A further increase in annealing temperature resulted in larger grains and greater surface roughness and void density, which, in turn, degraded the optoelectronic performance.

2

Microstructural Studies of Ag/TiO2 Thin Film; Effect of Annealing Temperature

Kamrosni Abdul Razak, Dewi Suryani Che Halin, Azliza Azani, Mustafa A.B.A. Mohd, Anuar M.S. Mohd Arif, Norsuria Mahmed, Chobpattana Varistha, Kaczmarek L., Jeż Bartłomiej, Nabiałek Marcin

Archives of Metallurgy and Materials

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2022

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Vol. 67, iss. 1

241--245

EN

Microstructures are an important link between materials processing and performance, and microstructure control is essential for any materials processing route where the microstructure plays a major role in determining the properties. In this work, silverdoped titanium dioxide (Ag/TiO2) thin film was prepared by the sol-gel method through the hydrolysis of titanium tetra-isopropoxide and silver nitrate solution. The sol was spin coated on ITO glass substrate to get uniform film followed by annealing process for 2 hours. The obtained films were annealed at different annealing temperatures in the range of 300°C-600°C in order to observe the effect on crystalline state, microstructures and optical properties of Ag/TiO2 thin film. The thin films were characterized by X-Ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectrophotometry. It is clearly seen, when the annealing temperature increases to 500°C, a peak at 2θ = 25.30° can be seen which refers to the structure of TiO2 tetragonal anatase. The structure of Ag/TiO2 thin film become denser, linked together, porous and uniformly distributed on the surface and displays the highest cut-off wavelength value which is 396 nm with the lowest band gap value, which is 3.10 eV.

3

Effect of low temperature annealing on anatase TiO2 layer as photoanode for dye-sensitized solar cell

Noorasid Nur Syamimi, Arith Faiz, Mustafa Ahmad Nizamuddin, Azam Mohd Asyadi, Suhaimy Syazwan Hanani Meriam, Al-Ani, Oras A.

Przegląd Elektrotechniczny

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2021

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R. 97, nr 10

12--16

EN

Dye-Sensitized Solar Cells (DSSCs) have been successfully fabricated with a low annealing temperature (100 °C to 500 °C) approach to the anatase TiO2 photoanode deposited by a screen-printing method. In this paper, the surface morphology and structure of the TiO2 thin films were studied using Scanning Electron Microscope (SEM), X-Ray Diffraction (XRD) and Raman Spectroscope while I-V characteristic was used for the electrical properties. Sample with an annealing temperature of 300 °C displays a good feature in terms of porosity and enhanced agglomerated surface.

PL

Ogniwa słoneczne uczulone barwnikiem (DSSC) zostały z powodzeniem wyprodukowane przy niskiej temperaturze wyżarzania (100 °C do 500 °C) z fotokomórką anatazu TiO2 osadzaną metodą sitodruku. W artykule zbadano morfologię powierzchni i strukturę cienkich warstw TiO2 przy użyciu skaningowego mikroskopu elektronowego (SEM), dyfrakcji promieniowania rentgenowskiego (XRD) i spektroskopu Ramana, natomiast dla właściwości elektrycznych wykorzystano charakterystykę I-V. Próbka o temperaturze wyżarzania 300 °C wykazuje dobrą cechę pod względem porowatości i zwiększonej powierzchni zaglomerowanej.

4

Synthesis of α-Fe2O3 nanoparticles and analyzing the effect of annealing temperature on its properties

Thimmiah Bhargavi Ram, Nallathambi Gobi

Materials Science Poland

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2020

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Vol. 38, No. 1

116--121

EN

α-Fe2O3 nanoparticles were synthesized via co-precipitation technique using ferric and ferrous salts and potassium hydroxide as precipitation agents. The samples were calcined at 350 °C, 550 °C and 750 °C for 3 hours. The obtained iron oxide was characterized by X-ray diffraction (XRD), thermogravimetric analysis (TGA), scanning electron microscopy (SEM), and dynamic light scattering (DLS). Crystallinity of the sample was studied by X-ray diffraction. SEM micrographs showed nonuniform size distribution of the particles forming agglomerates. TGA analysis revealed trace amount of weight loss and material stability for the samples calcined at temperatures above 500 °C. DLS results indicated that increasing of annealing temperature resulted in reduction of the particle size and more uniform size distribution. At the maximum annealing temperature of 750 °C, the mean diameter of the particles of 100 nm was observed.

5

Features of Formation Stress State of Amorphized Detonation Coatings of the Zr-Al-B Systems

Pashechko Mykhaylo, Kharchenko Olena, Shchepetov Vitaliy, Lenik Klaudiusz, Gladkiy Yaroslav

Advances in Science and Technology. Research Journal

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2019

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Vol. 13, no 2

46--50

EN

The results of experimental studies on the dependence of the thickness of amorphous-crystalline Zr-Al-B coatings on the value and level of distribution of type 1residual stresses were presented. It was demonstrated that residual compressive stresses arise in the surface layers of coatings, which in absolute value are not significant for its integrity and quality. It was established that the amorphous-crystalline composition, under the conditions of minimizing residual stresses and the optimal combination of the volume fraction of components, the structure and morphology of their components, has the best surface strength and wear resistance under friction compared to tungsten carbide and iron coatings

6

Compositional analysis of silicon oxide/silicon nitride thin films

Meziani S., Moussi A., Mahiou L., Outemzabet R.

Materials Science Poland

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2016

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Vol. 34, No. 2

315--321

EN

Hydrogen, amorphous silicon nitride (SiNx:H abbreviated SiNx) films were grown on multicrystalline silicon (mc-Si) substrate by plasma enhanced chemical vapour deposition (PECVD) in parallel configuration using NH3/SiH4 gas mixtures. The mc-Si wafers were taken from the same column of Si cast ingot. After the deposition process, the layers were oxidized (thermal oxidation) in dry oxygen ambient environment at 950 ºC to get oxide/nitride (ON) structure. Secondary ion mass spectroscopy (SIMS), Rutherford backscattering spectroscopy (RBS), Auger electron spectroscopy (AES) and energy dispersive X-ray analysis (EDX) were employed for analyzing quantitatively the chemical composition and stoichiometry in the oxide-nitride stacked films. The effect of annealing temperature on the chemical composition of ON structure has been investigated. Some species, O, N, Si were redistributed in this structure during the thermal oxidation of SiNx. Indeed, oxygen diffused to the nitride layer into Si2O2N during dry oxidation.

7

The effects of excitation conditions and annealing temperature on power loss in SMC cores

Ślusarek B., Jankowski B., Szczygłowski J., Chwastek K.

Przegląd Elektrotechniczny

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2015

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R. 91, nr 4

14-19

EN

The paper considers the effects of excitation conditions (maximum induction, frequency) and annealing temperature on power loss dissipated in cores made of commercially available soft magnetic composites. The study has confirmed that the choice of annealing temperature has a significant impact on the magnetic properties of ready-made cores. It has been found that Somaloy 500 cores annealed at 450° C feature the lowest loss density in a wide range of excitation frequencies. The dependencies: total power loss versus frequency have been described using four alternative descriptions. The results indicate that the considered dependencies are equivalent and may be approximately described with a two-term formula of the form: Ptotal = Whyst f + a f2.

PL

W pracy przedstawiono wpływ parametrów wymuszenia (maksymalna indukcja, częstotliwość) oraz temperatury wyżarzania na straty mocy rozpraszane w rdzeniach z komercyjnie dostępnych kompozytów magnetycznych SMC. Stwierdzono, że wybór temperatury wyżarzania ma istotny wpływ na właściwości magnetyczne gotowych rdzeni. Zaobserwowano, że rdzenie z materiału proszkowego Somaloy 500 wyżarzone w temperaturze 450° C wykazują najniższe straty w szerokim zakresie częstotliwości magnesowania. Zależność strat całkowitych od częstotliwości opisano za pomocą czterech alternatywnych formuł. Wyniki badań wskazują na fakt, że rozważane zależności mogą być potraktowane jako równoważne i opisane za pomocą formuły dwuskładnikowej w postaci Ptotal = Whyst f + a f2.

8

Annealing Effects on the Interband Transition and Optical Constants of Cobalt Doped Cadmium Oxide Thin Films

Habubi N. F.

International Letters of Chemistry, Physics and Astronomy

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2015

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Vol. 43

81--90

EN

The CdO: Co films have been deposited on substrate temperature at 400 °C by spray pyrolysis method using cadmium chloride and cobalt chloride as a precursors for Cd and Co ions, respectively. The effect of annealing temperature on optical constants of Co: CdO thin films are investigated using UV-Visible spectrophotometer in the range of (300-900) nm at room temperature. The absorbance and optical parameters such as α, n, ε1, ε2, and χ are increased when the annealing temperature increases, while the energy gap decreased from 2.5 eV before annealing to 2.48 eV after 500 °C annealing temperature. Urbach energy is increased with the increasing of annealing temperature from 353 meV for sample before annealing to 715 meV for the same samples annealed at 500 °C.

9

Wpływ temperatury wyżarzania na deformację oraz strukturę metalograficzną elementów formowanych laserowo

Mucha Z., Kurp P., Depczyński W., Młynarczyk P.

Zeszyty Naukowe Politechniki Świętokrzyskiej. Nauki Techniczne

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2014

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Z. 18

131--137

PL

W niniejszym artykule autorzy przedstawili wpływ temperatury wyżarzania na strukturę elementu ze stali S355, który uprzednio został poddany formowaniu laserowemu. Ponadto porównano wpływ tej temperatury na deformację elementów po formowaniu laserowym i mechanicznym.

EN

Affect of annealing temperature on the structure S355 steel elements, which previously has been laser formed, is presented in this paper. Affect of the temperature on the deformation both laser and mechanical formed elements is presented as well and compared each other.

10

Significant Influence of Annealing Temperature and Thickness of Electrode on Energy Conversion Efficiency of Dye Sensitized Solar Cell: Effect of Catalyst

Uddin J., Islam J. M. M., Khan S. M. M., Hoque E., Khan M. A.

International Letters of Chemistry, Physics and Astronomy

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2014

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Vol. 20, iss. 1

78--87

EN

Dye sensitized solar cell (DSSC) shows great promise as an alternative to conventional p-n junction solar cells due to their low fabrication cost and reasonably high efficiency. DSSC was assembled by using natural dye extracted from red amaranth (Amaranthus Gangeticus) as a sensitizer and different catalysts for counter electrode were applied for maximum energy conversion efficiency. Annealing temperature and thickness of electrode were also investigated and optimized. Catalyst, annealing temperature and thickness were optimized by the determination of cell performance considering photoelectrochemical output and measuring current and voltage; then calculating efficiency and other electrical parameters. The experimental results indicated that samples having 40 μm electrode thickness and prepared at 450 o C annealing temperature showed the best performance.

11

Optical and surface morphological studies on CuPcOC8 thin films prepared by physical vapour deposition

Vadakel V. T., Menon C. S.

Materials Science Poland

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2013

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Vol. 31, No. 3

391--396

EN

2,3,9,10,16,17,23,24-copper octakis (octyloxy) phthalocyanine (CuPcOC8) thin films deposited at room temperature have exhibited a change in their surface morphology with the post deposition annealing temperature under normal atmosphere.These films have been characterised by optical absorption also. SEM images have shown densely packed nano particles and nano-rod like structures on the substrates annealed at different temperatures. The optical transition was found to be direct allowed and the direct energy gap changed with the annealing temperature. The results of optical and surface morphological studies on CuPcOC8 have been discussed.

12

The influence of annealing temperature and time on the structure and features of the Al-Si coatings on steel sheets, purposed for pressured welded pipes applied in exhaust systems

Żaba K.

Archives of Civil and Mechanical Engineering

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2009

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Vol. 9, no 2

145-152

EN

The research results shown in the article characterize the initial state of the Al-Si coating on the steel sheet and its evolution, being an effect of the influence of the temperature and the time. The heating was carried out in different temperatures (up to 800 °C) and in different periods. After the heating, observation of the sections with the appliance of a scanning electron microscope was realized and microanalyses of the chemical composition were carried out. The state and the features of the coatings were also tested in technological tests by bumping, deep drawing, bending and expanding. The results of microhardness research, documenting structural changes, are also presented.

PL

Przedstawione w artykule wyniki badań charakteryzują stan początkowy powłoki Al-Si oraz jej ewolucję skutkiem oddziaływania temperatury i czasu. Nagrzewanie prowadzono w różnych temperaturach (do 800 °C) i w różnych czasach. Po nagrzewaniu dokonano obserwacji przekrojów za pomocą elektronowego mikroskopu skaningowego oraz dokonano mikroanaliz składu chemicznego. Badano również stan i własności powłok w testach technologicznych, w tym mikrotwardość, dokumentującą zmiany strukturalne.

13

Wpływ temperatury wyżarzania na własności mechaniczne blachy bimetalowej Cu/Al

Muzykiewicz W., Rękas A.

Obróbka Plastyczna Metali

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2000

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T. 11, nr 3

73-82

PL

Opracowano wykres zależności własności mechanicznych blachy bimetalowej Cu/AI od temperatury wyżarzania, wypełniąc tym samym lukę literaturową w tym zakresie. O silnym oddziaływaniu złącza na własności kompozytu Cu/AI świadczy w szczególności charakter zmian wydłużenia w funkcji temperatury obróbki cieplnej. Wyznaczono optymalny zakres temperatur wyżarzania rekrystalizującego, mieści się on w przedziale (350-370) °C. Za optymalną temperaturę rekrystalizacji uznano 360 °C, przyjmując jako kryterium maksymalną plastyczność bimetalu przy dostatecznie wysokiej wytrzymałości. W oparciu o ryfuzyjną hipotezę tworzenia się struktury złącza, podjęto próbę wyjaśnienia intensywnego spadku plastyczności i wytrzymałości kompozytu Cu/AI po wyżarzeniu go w temperaturze 550 °C. Z przeprowadzonej analizy rozkładów własności mechanicznych w płaszczyźnie blachy wynika, że blachę bimetalową Cu/AI po obróbce cieplnej, w przeciwieństwie do blachy umocnionej, cechuje znacznie większa izotropia własności wytrzymałościowych niż plastycznych. W pracy zwrócono też uwagę na odkształcenia termiczne obrabianego cieplnie materiału.

EN

The diagram of the dependence of the mechanical properties of Cu/Al composite sheet on the annealing temperaturę has been worked out, filling a gap in the professional literaturę in this respect. The strong interaction of the joint on the properties of Cu/Al laminar composite materiał is evidenced, in particular, by the character of changes in the elongation as a function of the temperaturę of thermal treatment. The determined optimal rangę of the recrystallizing annealing temperaturę is contained in the interval IJ350-370D °C. 360 °C has been found to be the optimal recrystallization temperaturę assuming as a criterion the maximal plasticity of bimetallic sheet with sufficiently high strength. Basing on the diffusion theory of the formation of the joint structure, attempt has been madę to account for the intense drop of plasticity and strength of Cu/Al composite after its annealing at the temperaturę 550 CC. From the performed analysis of the distribution of the mechanical properties in the sheet pianę it follows that Cu/Al composite sheet after its thermal treatment, as contrasted with hardened sheet, demonstrates a much greater isotropy of the strength properties when compared with the isotropy of the plastic properties. In the study attention has been also given to thermal deformations of the materiał subjected to heat treatment.