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Amorphous phase formation of Zr-Cu thin films fabricated by magnetron co-sputtering

Li L. X., Zhang D. T., Li M., Wang H. X.

Materials Science Poland

2009

Vol. 27, No. 2

539--545

ZrxCu1-x amorphous films were prepared on Si(111) substrates by magnetron co-sputtering of pure Zr and Cu targets. It was found that the amorphous forming ability of the films increased with x when x was smaller than 65. It was therefore different from their bulk counterparts, which only for x = 35 and 50 were reported to have high glass forming ability during casting. The structures of the films were sensitive to the substrate temperature and the sputtering pressure of argon. X-ray diffraction and atomic force microscopic analyses of the Zr65Cu35 amorphous films annealed at various temperatures confirmed that the crystallization temperature was approximately 573 K.

Pulsed laser deposited amorphous magnetic films for strain detection.

Kahlen O., Benziger T., Regener D.

Inżynieria Materiałowa

2001

R. XXII, nr 4

423-425

Amorphous magnetic Fe-B-Si films have been produced by means of KrF laser ablation of Fe78B13Si9 amorphous magnetic ribbons. Laser fluence, repetition rate and the number of pulses were the variable parameters. TEM and AFM investigations of the deposited films exhibited a hetero-amorphous structure with dimensions in the 4-6 nm range. Physical parameters, such as the Curie temperature value and electrical resistance were comparable to those of the initial ribbon target material. Strain dependent eddy current measurements revealed a linear and very high signal response to applied strains, showing the films potential for a variety of applications until now performed by strain gauges.