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Deposition and Analysis of DLC Thin Films Obtained on 7075 Aluminum Alloy

Kuffova M., Marton M., Kottfer D., Rehak F.

Problemy Mechatroniki : uzbrojenie, lotnictwo, inżynieria bezpieczeństwa

2017

Vol. 8, Nr 3 (29)

33--42

In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without and with admixture gas (N2) using a DC CVD (direct current chemical vapor deposition) method. The structural and mechanical properties were analyzed using Raman spectroscopy, SEM and nanoindentation. We obtained hardness of a-C:H thin film without and with N2 equal to 27.3 GPa and 21.4 GPa, respectively. Values of the Young’s modulus were equal to 135.5 GPa and 205.2 GPa, respectively.