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1 Polish Journal of Chemical Technology

1 2024

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Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

Wan Lili, Yang Jie, Liu Xiaoru, Zhu Jiayi, Xu Gang, Hao Chenchun, Chen Xuecheng, Xiong Zhengwei

Polish Journal of Chemical Technology

2024

Vol. 26, nr 2

25--30

A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in refectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2 . The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.