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1 Polish Journal of Applied Chemistry

1 2005

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Thin films deposited in barrier discharge under atmospheric pressure

Rżanek-Boroch Z., Lamenta A., Górska A.

Polish Journal of Applied Chemistry

2005

Vol. 49, nr 1-2

49-51

A laboratory scale plasma enhanced chemical vapor deposition (PE-CVD) process was developed for obtaining thin films from tetramethoxysilane (TMOS) in mixtures with He and O2 on silicon single crystals using electric discharges, stabilized with a dielectric barrier under atmospheric pressure. The films deposited were of a good adhesion to the substrate and smooth. The rate of films deposition was measured and their composition was determined by infrared spectroscopy with Fourier transformation (FTIR) and X-ray photoelectron spectroscopy (XPS). The topography of the films was determined using atomic force microscope (AFM).