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EN
This paper presents the effects of elimination of current oscillations within the coaxial plasma accelerator during IPD deposition process on the morphology, phase structure and properties of synthesized TiN coatings. Current observations of waveforms have been made by use of an oscilloscope. As a test material for experiments, titanium nitride TiN coatings synthesized on silicon and high-speed steel substrates were used. The coatings morphology, phase composition and wear resistance properties were determined. The character of current waveforms in the plasma accelerator electric circuit plays a crucial role during the coatings synthesis process. Elimination of the current oscillations leads to obtaining an ultrafine grained structure of titanium nitride coatings and to disappearance of the tendency to structure columnarization. The coatings obtained during processes of a non-oscillating character are distinguished by better wear-resistance properties.
EN
This work presents the very first results of the application of plasma magnetic filtering achieved by a coil coupled with an electrical circuit of a coaxial accelerator during the synthesis of AlN thin films by use of Impulse Plasma Deposition method (IPD). The uniqueness of this technical solution lies in the fact that the filter is not supplied, controlled and synchronized from any external device. Our solution uses the energy from the electrical circuit of plasma accelerator. The plasma state was described on the basis of OES studies. Estimation of the effects of plasma filtering on the film quality was carried out on the basis of characterization of structure morphology (SEM), phase and chemical composition (vibrational spectroscopy). Our work has shown that the use of the developed magnetic self-filter improved the structure of the AlN coatings synthesized under the condition of impulse plasma, especially by the minimization of the tendency to deposit metallic aluminum droplets and columnar growth.
PL
W pracy zaprezentowane zostały pierwsze wyniki obserwacji skutków materiałowych zastosowania zaworu impulsowego dozującego gaz do koaksjalnego akceleratora plazmy impulsowej w metodzie IPD. Wynika z nich, że produktem syntezy jest materiał warstwy zbudowany z nanokrystalicznych graniastych ziarn, co sugeruje heterogeniczny mechanizm zarodkowania.
EN
In the paper were described the very first observations of the material effects of the impulse valve using for gas injection to the coaxial accelerator during the impulse plasma deposition. Coatings deposited in such conditions were nanocrystalline with grains morphology characteristic for coatings nucleated heterogenically on the substrate surface.
PL
W poniższych badaniach przedstawione zostały zależności morfologii powłok TiN otrzymanych metodą IPD od parametrów przeprowadzania procesów oraz materiału podłoży. Dodatkowym rezultatem badań jest obserwacja różnic w morfologii otrzymanych warstw od geometrii uktadu oraz anizotropowa budowa i rozmieszczenie nanokrystalitów tworzących powłokę.
EN
This paper presents a study of synthesis layers in conditions of impulse mass and energy transport. In this case we used Impulse Plasma Deposition method (IPD). The synthesis processes were conducted in a device equipped with two independent and alternately working accelerators of impulse plasma. The sources of Fe and Ti were the internal electrodes of these impulse plasma accelerators, made of titanium and iron. The plasma-generating gas was argon. The layers were deposited on silicon substrates. The material synthesized in the present experiment was an Fe-Ti alloy.
PL
W komunikacie przedstawiono wyniki eksperymentów, które, jak się wydaje, potwierdzają wysuniętą dwa lata temu hipotezę o możliwości istnienia pseudoźródła elektronów w poosiowym obszarze przyelektrodowym akceleratora plazmy impulsowej w metodzie IPD. Źródło to, emitujące elektrony w formie strumieni elektronów, jest odpowiedzialne za dostarczanie do plazmy materiału elektrody wewnętrznej.
EN
Experimental results are presented to support a previously proposed thesis on role of electron pseudosource in nearelectrode region of IPD accelerator. Presented facts prove that electron beams are directly responsible for inner electrode material supply to plasma.
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