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EN
In this study, thin Al2O3 films (11 nm – 82 nm) were deposited by means of a recently developed pulse gas injection magnetron sputtering method and investigated by means of atomic force microscopy, spectroscopic ellipsometry and spectrophotometry. Quite low values of optical constants (1.581 to 1.648 at λ = 550 nm) of the alumina films are directly associated with specific growth conditions (pulse injection of the reactive or reactive + inert gas) in the pulse gas injection magnetron sputtering process. The light transmittance of Al2O3/glass systems (86 % to 90 %) is only a few percent lower than that calculated for glass (93 %).
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EN
The aim of the present paper has been to verify the effectiveness and usefulness of a novel deposition process named GIMS (Gas Injection Magnetron Sputtering) used for the first time for deposition of Ti/TiO2 coatings on large area glass substrates covered in the condition of industrial scale production. The Ti/TiO2 coatings were deposited in an industrial system utilizing a set of linear magnetrons with the length of 2400 mm each for covering the 2000 x 3000 mm glasses. Taking into account the specific course of the GIMS (multipoint gas injection along the magnetron length) and the scale of the industrial facility, the optical coating uniformity was the most important goal to check. The experiments on Ti/TiO2 coatings deposited by the use of GIMS were conducted on substrates in the form of glass plates located at the key points along the magnetrons and intentionally non-heated during any stage of the process. Measurements of the coatings properties showed that the thickness and optical uniformity of the 150 nm thick coatings deposited by GIMS in the industrial facility (the thickness differences on the large plates with 2000 mm width did not exceed 20 nm) is fully acceptable form the point of view of expected applications e.g. for architectural glazing.
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