Modifications to the 306 Edwards sputtering system have been discussed for the production of sensitive thin films, specifically amorphous pyroelectric perovskite films. For technical reasons, it is not possible to produce high quality thin films using standard sputtering systems. Furthermore, additional problems arise with the reproducibility of the films. The authors found that in unmodified sputtering systems, a general problem is that independent adjusting of the pressure in the chamber and the gas flow during the sputtering is not possible. Additional problems were low accuracy of gas ratio measurements, and high temperature radiation during sputtering which made impossible keeping the temperature conditions during deposition. Modifications to a standard set-up have been proposed and its operation has been checked. As a test-case, SrTiO3 thin film samples were fabricated. Their high quality confirmed validity of the modifications.
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