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Investigation of low-temperature plasmas formed in low-density gases surrounding laser-produced plasmas

Majszyk Mateusz, Bartnik Andrzej, Skrzeczanowski Wojciech, Fok Tomasz, Węgrzyński Łukasz, Szczurek Mirosław, Fiedorowicz Henryk

Nukleonika

2023

Vol. 68, No. 1

11--17

Low-temperature plasma production is possible as a result of photoionization using high-intensity extreme ultraviolet (EUV) and soft X-ray (SXR) pulses. Plasma of this type is also present in outer space, e.g., aurora borealis. It also occurs when high-velocity objects enter the atmosphere, during which period high temperatures can be produced locally by friction. Low-temperature plasma is also formed in an ambient gas surrounding the hot laser-produced plasma (LPP). In this work, a special system has been prepared for investigation of this type of plasma. The LPP was created inside a chamber fi lled with a gas under a low pressure, of the order of 1–50 mbar, by a laser pulse (3–9 J, 1–8 ns) focused onto a gas puff target. In such a case, the SXR/EUV radiation emitted from the LPP was partially absorbed in the low-density gas. In this case, high- and low-temperature plasmas (Te ~100 eV and ~1 eV, respectively) were created locally in the chamber. Investigation of the EUV-induced plasmas was performed mainly using spectral methods in ultraviolet/visible (UV/VIS) light. The measurements were performed using an echelle spectrometer, and additionally, spatial–temporal measurements were performed using an optical streak camera. Spectral analysis was supported by the PGOPHER numerical code.

Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors

Torrisi A., Wachulak P., Torrisi L., Bartnik A., Węgrzyński Ł., Fiedorowicz H.

Nukleonika

2016

Vol. 61, No. 2

139--143

An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ = 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.