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Use of Rhizosphere Microorganisms in Plant Production – A Review Study

Paliwoda Dominika, Mikiciuk Grzegorz

Journal of Ecological Engineering

2020

Vol. 21, nr 8

292--310

Minimizing or neutralizing the effects of environmental stresses on crop plants, protecting against pests and diseases, and at the same time ensuring optimal plant growth and development are currently the most important tasks faced by growers and plant producers around the world. Nowadays, the goal is to limit the use of chemicals as much as possible to protect the environment and improve the quality of food. The interest in the use of beneficial rhizosphere microorganisms is becoming global, as it can represent an environmentally friendly alternative to chemicalization in the era of threats to crop cultivation in the modern world (climate change, drought, salinity, introduction of plant pests).

Structure and morphology of hydrogen reduced surface of bismuth germanate and bismuth silicate glasses

Kusz B., Trzebiatowski K., Gazda M., Murawski L.

Optica Applicata

2003

Vol. 33, nr 1

141-146

Bismuth nanoclusters embedded in germanate glass matrices and surface layer of bismuth grains have been obtained by thermal treatment in hydrogen atmosphere of Bi0.33Ge0.67O1.84 and Bi0.57Si0.43O1.72 glasses. A simple two-layer model of reduced glasses, proposed by us on the basis of XRD and AFM studies, explains the evolution of surface layer and electrical properties of the materials during the reduction process.

Roughness of amorphous Zn-P thin films

Jarząbek B., Jurusik J., Cisowski J., Nowak M.

Optica Applicata

2001

Vol. 31, nr 1

93-101

The effect of thickness variation and the surface roughness of amorphous Zn/sub 32/P/sub 68/ thin films has been investigated by the interference spectroscopy of the optical transmittance and reflectance, as well as by the atomic force microscopy (AFM). The analysis of the optical data allowed determination of the standard deviation of the thin film thickness by taking into account the Gaussian distribution of the change in phase of radiation traversing a thin film. It appears that the value of the standard deviation of the film thickness determined from the optical interference spectroscopy ( sigma /sub w/ approximately=26 nm) is comparable with the value of the mean surface roughness (R/sub a/ approximately=19 nm) evaluated from the AFM studies.