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1

Modification of the Structure and Properties of FeSiB Amorphous Ribbon by Interference Pulsed Laser Heating

Czyż O., Kusiński J., Radziszewska A., Ostrowski R., Morgiel J., Kanak J., Kąc M.

Archives of Metallurgy and Materials

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2018

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Vol. 63, iss. 4

2001--2007

EN

Paper describes the results of Fe80Si11B9 amorphous ribbon investigation after pulsed laser interference heating and conventional annealing. As a result of interference heating periodically placed laser heated microareas were obtained. Structure characterisation by scanning and transmission electron microscopy showed in case of laser heated samples presence of crystalline nanostructure in amorphous matrix. Microscopy observations showed significant difference in material structure after laser heating – nanograin structure, and material after annealing – dendritic structure. Magnetic force microscopy investigation showed expanded magnetic structure in laser heated microareas, while amorphous matrix did not give magnetic signal. Change of magnetic properties was examined by magnetic hysteresis loop measurement, which showed that the laser heating did not have a significant influence on soft magnetic properties.

2

In situ TEM observation of reaction of Ti/Al multilayers

Morgiel J., Marszałek K., Pomorska M., Maj Ł., Mania R., Kanak J., Rutkowski P.

Archives of Civil and Mechanical Engineering

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2017

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Vol. 17, no. 1

188--198

EN

The Ti/Al multilayers of nominal periods λ = 50 nm and λ = 200 nm were deposited using double target magnetron system equipped with rotating substrate holder. The in situ TEM experiments were aimed at explaining DSC measured exothermic effects through phase transformations taking place during heating of the multilayers with small and large period. Thin foils for these examinations were cut with FIB. The performed experiments showed that the as deposited multilayers are characterized by presence of coarse pseudo-columnar crystallites built of alternating hex-Ti and fcc-Al. The intermixed region at the internal interfaces extends up to 10 nm, i.e. the areas filled with mutually alloyed material starts to dominate over those of pure metals for multilayers of λ < 30 nm. The DSC measurements indicated that in both multilayers their reaction are split to two stages, but those in the small period take place at much lower temperature range, than that in the large period one.

3

Research into the relationship between the surface topography, texture and mechanical properties of PVD-Cu/Ni multilayers

Kucharska B., Kulej E., Pyka G., Kanak J., Stobiecki T.

Materials Science Poland

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2013

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Vol. 31, No. 1

101-107

EN

The paper presents the results of structural examinations and mechanical tests of Cu/Ni multilayers fabricated by the magnetron sputtering method. The investigated multilayers were differentiated by Ni sublayer thickness (1, 3 and 6 nm), while the retaining Cu sublayer thickness was unchanged (2 nm). Measurements demonstrated that the multilayers were strongly textured in the direction of their growth [111], with the thinnest multilayer (Cu/Ni = 2/1) showing a stronger texture. Stronger texturing was associated with greater surface roughness. Multilayers with the largest thickness had higher hardness and Young's modulus. The properties of Cu/Ni multilayers depended both on the thickness of their sublayers, as well as on their total thickness.

4

X-ray, AFM, UV-VIS-IR analysis of a-Si:H/.mu.c-Si:H supperlattice structure

Kołodziej A., Baranowski W., Kusior E., Kanak J.

Optica Applicata

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2011

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Vol. 41, nr 2

449--454

EN

The use of the cyclic method of the deposition of multilayer amorphous and microcrystalline silicon films, based on the knowledge of a phase transient algorithm for silicon in low temperature conditions (below 250 °C), can give a possibility of creating silicon quantum dot structures. The thickness, crystallographic structure, optical gap as well as film and interface roughnesses of the amorphous Si:H and ?c-Si:H dot layer on glass and multicrystalline substrate were systematically studied by atomic force microscopy (AFM), small angle X-ray and UV-VIS-IR technique. It was developed on the base of these measurements that there is the phase transition from amorphous a-Si:H to multinanocrystalline Si structure with 4-15 nm crystallites.

5

Hardness and texture of Cu/Ni multilayers differing in Ni sublayer thickness

Kulej E., Kucharska B., Kanak J.

Inżynieria Materiałowa

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2011

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Vol. 32, nr 4

514-516

EN

The article describes the results of the study of Cu/Ni multilayer coats deposited on a monocrystalline Si(100) silicon substrate by the magnetron sputtering method. Composed of 100 bilayers each, the multilayers were differentiated by Ni sublayer thickness (1.2÷3 nm), while maintaining the constant Cu sublayer thickness (2 nm). The multilayer coats were characterized by nanohardness and Young modulus tests and texture measurement by the w (rocking curve) method. The tests showed that the mechanical properties of the multilayers were substantially influenced by the Cu to Ni sublayer thickness ratio and by the coat texturing degree. The highest hardness and, at the same time, the lowest texture was exhibited by the Cu/Ni = 2/1.6 nm and Cu/Ni = 2/2.5 multilayers.

PL

W pracy przedstawiono wyniki badań wielowarstw Cu/Ni osadzonych na monokrystalicznym, krzemowym podłożu Si(100) techniką osadzania magnetronowego. Wielowarstwy złożone ze 100 biwarstw zróżnicowano grubością podwarstwy Ni (1,2÷3 nm) przy zachowaniu stałej grubości podwarstwy Cu (2 nm). Powłoki wielowarstwowe scharakteryzowano badaniami nanotwardości, modułu Younga i pomiaru tekstur metodą w (rocking curve). Badania wykazały, że na własności mechaniczne wielowarstw istotnie wpływją: stosunek grubości podwarstw Cu i Ni oraz stopień steksturowania powłoki. Największą twardość, a zarazem najsłabszą teksturę wykazują wielowarstwy Cu/Ni = 2/1,6 nm i Cu/Ni = 2/2,5 nm.

6

Investigation of the topography of magnetron-deposited Cu/Ni multilayers by X-ray reflectometry and atomic force microscopy

Kucharska B., Kulej E., Kanak J.

Optica Applicata

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2009

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Vol. 39, nr 4

881-888

EN

This paper presents the results of research of Cu/Ni multilayers magnetron-deposited on an Si (100) substrate. The thickness of Cu sublayers was identical in all multilayers and equalled 2 nm. The thickness of Ni sublayers varied between 1.2 and 3.0 nm. The surface topography of the multilayers was examined using the AFM (research of different areas). The interface roughness and period thickness were characterized by X-ray reflectometry (XRR). The roughness of the multilayers achieved by the XRR method was very similar for all 0.6 nm samples examined. However, the values of the roughness parameter Ra obtained by AFM examination were in the range of 0.09-0.32 nm, and depended on the size of the area examined. Based on the function obtained from the AFM measurements, taken on surface areas varying in size, an area of 1.5-4.0 cm2 was determined, for which an agreement between the roughness parameter, as determined by the AFM method, and the XRR method results would be expected.

7

Micromagnetic properties of Co/Pt multilayers deposited on different buffer layers

Czapkiewicz M, Kanak J, Stobiecki T, Kachel M, Żołądź M, Sveklo I, Maziewski A, Van-Dijken S

Materials Science Poland

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2008

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Vol. 26, No. 4

839--848

EN

A study on the buffer layer dependence of the film texture, surface roughness, and magnetization reversal process in Co/Pt multilayers prepared by dc magnetron sputtering is presented. Oxidized Si(100) wafer was covered with four different buffers: (A) 10 nm Cu, (B) 5 nm Ta/10 nm Cu, (C) 5 nm Ta/10 nm Cu/5 nm Ta, and (D) 5 nm Ta/10 nm Cu/5 nm Ta/10 nm Cu. The growth of [2 nm Pt/0.5 nm Co]×5/2 nm Pt on top of these buffer layers results in a large variation in the fcc (111) Co/Pt texture and surface morphology. All films have the perpendicular magnetic anisotropy but magnetization reversal process, studied by the magnetooptic Kerr effect (MOKE) and magnetic force spectroscopy (MFM), strongly depends on the buffer used. Observation of magnetic domains evolution under a MOKE microscope allows one to calculate from magnetization relaxation curves average dispersion of energy barriers of the thermal activated magnetization switching process. The application of MFM in external magnetic field allows one to follow the dynamics of direct and indirect magnetization switching procesess up to submicrometer scale.

8

Zastosowanie niskokątowej analizy promieniowania x (GIXA) do badań układów cienkowarstwowych

Mietniowski P., Powroźnik W., Kanak J., Stobiecki T., Kuświk P.

Elektronika : konstrukcje, technologie, zastosowania

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2008

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Vol. 49, nr 1

48-51

PL

Niskokątowa analiza promieniowania X (GIXA: Grazing Incidence X-Ray Analysis) w badaniach niniejszej pracy jest kombinacją pomiarów reflektometrycznych (XRR: X-Ray Reflectivity) i kątowej zależności fluorescencji promieniowania X (AD-XRF: Angle-Dependent X-Ray Fluorescence). Metoda XRR jest powszechnie stosowaną techniką pomiarów grubości i szorstkości cienkich warstw. Pomiary XRR i AD-XRF wykonano na dyfraktometrze firmy Philips X'Pert MPD. W przypadku pomiarów AD-XRF został zastosowany chłodzony ciekłym azotem detektor Si(Li) firmy Canberra. Wykonano pomiary dla układów wielowarstwowych [Ni80Fe20/Au] ×15 i [Ni80Fe20/Au/Co/Au] ×10. Stwierdzono występowanie charakterystycznych maksimów braggowskich na krzywej XRR i maksimów interferencji fali stojącej krzywej AD-XRF odpowiadających grubościom periodów NiFe+Au dla pierwszego i NiFe+Au+Co+Au dla drugiego układu wielowarstwowego. Dla obu metod otrzymano dobrą zgodność wyników pomiaru grubości poszczególnych warstw składowych badanych układów.

EN

Grazing Incidence X-Ray Analysis (GIXA) is a non-destructive technique and has the potential to be powerful and versatile analytical method because it combines X-ray reflectivity (XRR) and angle-dependent X-ray fluorescence (AD-XRF). XRR is well-known method for the determination of thickness, surface and interface roughness of thin layers and multilayer systems. A complementary technique is AD-XRF, with which the compositional depth profile of the layered materials can be determined. The measurements of XRR and AD-XRF were performed on Philips X'Pert diffractometer. In the case of AD-XRF, the liquid-N2 cooled Si-Li Canberra detector was installed in order to measure the energy spectrum of X-ray fluorescence radiation from the multilayer sample. We applied these techniques for study the profiles of XRR and AD-XRF spectra of the periodic multilayer systems of [NiFe/Au] ×15 and [Ni80Fe20/ Au/Co/Au] × 10. Characteristic Bragg diffraction maxima of XRR curve and maxima of standing wave interferences in AD-XRF curves corresponding to the thickness of superlattice periods: Ni80Fe20+Au for the first and Ni80Fe20+Au +Co+Au for the second multilayer system. For both methods a good agreement of thickness measurements were obtained.

9

Application of silicon strip detector for X-ray diffraction on metallic multilayers

Mietniowski P., Kanak J., Powroźnik W., Stobiecki T., Maj P., Gryboś P.

Archives of Metallurgy and Materials

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2008

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Vol. 53, iss. 1

75-81

EN

This paper presents silicon strip detector designed at AGH with front-end electronics based on ASIC (Application Specific lntergraded Circuits) which is used for diffraction measurements of thin films. Application of this detector for diffraction, in comparison to the standard proportional counter, allows to reduce time of measurement up to 100 times. Two types of 128-strip detectors with pitch between strips centers of 75 µm and 100 µm were tested. Angular resolution was determined from measurements of powder standard reference material (SRM 660) LaB 6 . It was demonstrated that detector with strip pitch 75 µm had better angular resolution than that of 100 µm one. The XRD measurements were performed on the metallic polycrystalline multilayers deposited by sputtering technique: Si(100)/Si0 2 47 nm/buffer/IrMn 12 nm/CoFe 15 nm/A1-0 1.4 nm/NiFe 3 nm/Ta 5 nm and Si(100)/Si0 2 500 nm/buffer/[Pt 2 nm/Co 0.5 nm]x5. The samples were prepared with four different buffers in order to obtain different texture degree (in the brackets buffers for Pt/Co multilayers): (a) Cu 25 nm, (Cu 10 nm) (b) Ta 5 nin/Cu 25 nm, (Ta 5 nm/Cu 10 nm) (c) Ta 5 nm/Cu 25 nm/Ta 5 nm/Cu 5 nm, (Ta 5 nm/Cu 10 nm/Ta 5 nm) and (d) Ta 5 nm/Cu 25 nm/Ta 5 nm /NiFe 2 nm/Cu 5 tun, (Ta 5 nm/Cu 10 nm/Ta 5 nin/Cu 10 nm). The results measured by our strip detector, conventional proportional counter and commercial X'Celerator detector are similar in all details specific for diffraction of multilayer. Some advantages of the strip detectors usage for structural analysis of thin films are discussed.

PL

Krzemowe detektory paskowe zintegrowane z elektroniką "front-end" zaprojektowane na AGH w oparciu o uklad ASIC (Application Specific Intergraded Circuits) zostały wykorzystane do detekcji promieniowania rentgenowskiego w eksperymentach dyfrakcyjnych ukladów cienkowarstwowych. Zastosowanie tych detektorów w porównaniu z licznikami proporcjonalnymi pozwala zredukowae czas pomiaru do okolo 100 razy. Przetestowano dwa typy detektorów 128-paskowych o odległościach pomiędzy paskami 75 µm i 100 µm. Pomiary kątowej zdolności rozdzielczej wykonane na próbkach proszkowych LaB6, pokazały, że detektor z odległością pomiędzy paskami 75 µm posiada lepszą zdolność rozdzielczą. Przeprowadzono pomiary dyfrakcyjne na wybranych układach cienkowarstwowych naniesionych techniką jonowego rozpylenia. Układy te miały następującą budowę: podłoże Si(100)/Si02 47 µm /warstwy buforowe /IrMn 12 nm/CoFe 15 nm/A1-0 1.4 mn/NiFe 3 nm/Ta 5 nm oraz Si(100)/Si02 500 nm/warstwy buforowe/[Pt 2 nm/Co 0.5 nm]x5. Jako warstwy buforowe zastosowano następujące układy wielowarstwowe (w nawiasach warstwy buforowe dla ukladów wielowarstwowych Pt/Co): (a) Cu 25 nm, (Cu 10 nm) (b) Ta 5 nm/Cu 25 nm, (Ta 5 lini/Cu 10 nm) (c) Ta 5 11111/Cu 25 nm/Ta 5 nm/Cu 5 nm, (Ta 5 nm/Cu 10 nin/Ta 5 nm) and (d) Ta 5 nm/Cu 25 nm/Ta 5 nm /NiFe 2 nm/Cu 5 nm, (Ta 5 tn/Cu 10 nm/Ta 5 nm/Cu 10 nm). Otrzymano podobne wyniki zarówno przy wykorzystaniu licznika proporcjonalnego, detektora paskowego jak i komercyjnego detektora X'Celerator. Przedyskutowano zalety krzemowego detektora paskowego w zastosowaniu do badań dyfrakcyjnych układów cienkowarstwowych.

10

Comparison of the effects of single-mass and plate tuned dampers on vibrations and noise

Ondrouch J., Kanak J., Bilosova A.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2006

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z. 31

117-120

EN

This paper deals with comparison of effects of two types of tuned absorbers -a single-mass (one degree-of freedom) damper and a plate damper (continuum type). Their effects on vibrations and noise produced by simple model of machine part were explored. The model was represented by a cantilever beam.

11

The influence of damping layer arrangement of the efficiency of vibration and noise dampers

Bilosova A., Ondrouch J., Kanak J.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2005

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z. 29

367-372

EN

The paper deals with the results of experimental research focused on the assessment of the influence of steel-rubber layers on the efficiency of plate vibration and noise dampers. The influence on vibration reduction is evaluated on the base of frequency response functions and 1/3 octave band analysis of averaged autospectra of velocity of vibrations, the influence on acoustic emission is evaluated on the base of 1/3 octave analysis of averaged spectra of acoustic pressure and acoustic power.

PL

W pracy zamieszczono wyniki badań eksperymentalnych dotyczących oceny wpływu warstw stalowo-gumowych na wydajność drgań płyty i tłumienia hałasu. Wpływ na redukcję drgań jest oceniany na podstawie funkcji odpowiedzi częstości i analizy 1/3 zakresu oktawy uśrednionych wartości autospektra prędkości drgań; wpływ na emisję dzwięku jest oceniany na podstawie analizy 1/3 oktawy uśrednionych wartości widma ciśnienia akustycznego i mocy akustycznej.

12

Influence of fibreglass layers on the efficiency of vibration and noise plate dampers

Ondrouch J., Kanak J., Bilosova A.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2005

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z. 28

109-114

EN

The paper deals with the results of experimental research focused on the assessment of the influence of fibreglass layers on the efficiency of plate vibration and noise dampers. The influence on vibration reduction is evaluated on the base of frequency response functions and 1/3 octave band analysis of averaged autospectra of velocity of vibrations, the influence on acoustic emission is evaluated on the base of 1/3 octave analysis of averaged spectra of acoustic pressure and acoustic power.

13

Microstructure and texture of Ir-Mn based magnetic tunnel junctions

Kanak J., Stobiecki T., Reiss G., Bruckl H.

Archives of Metallurgy and Materials

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2005

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Vol. 50, iss. 2

295-301

EN

Magnetic tunnel junctions (MTJs) with the structure: substrate Si(100)/SiOx 47nm/system of seed-buffer layers /IrMn 12nm/CoFe 15nm/AlOx 1.4nm/NiFe 3nm/Ta 5nm were prepared with four different buffers: (a) Cu 25nm, (b) Ta 5nm/Cu 25nm, (c) Ta 5nm/Cu 25nm/Ta 5nm/Cu 5nm and (d) Ta 5nm/Cu 25nm/Ta 5nm/NiFe 2nm/Cu 5nm in order to enhance crystal texture of the MTJs. The annealed in vacuum at 275C junctions were characterized by XRD &Theta-2&Theta-scans, rocking curve (&omega- scans) and pole figures, in order to establish the correlation between texture and magnetic exchange bias coupling of IrMn/CoFe. The texture degree in the stack of MTJ depends on material, which was used for the buffer layers, and sequence of the layers. The strongest texture has been obtained if the seed layer of Ta was used (buffer (b)). The multilayer stack is textured in columnar-like fashion, which produces roughness. It was found, from the analysis of magnetic hysteresis loops and rocking curves of the CoFe layer, that the exchange bias and coercivity fields of CoFe pinned layer increase about two times in the case of using strong textured seed-buffer system (b). The design of seed-buffer layers allows to optimize the exchange bias coupling in magnetoelectronics devices.

PL

Magnetyczne złącza tunelowe o strukturze wielowarstwowej: podłoże Si(100)/SiOx 47nm/warstwy buforowe /IrMn 12nm/CoFe 15nm/AlOx 1.4nm/NiFe 3nm/Ta 5nm zostały napylone z użyciem czterech różnych układów warstw buforowych: (a) Cu 25nm, (b) Ta 5nm/Cu 25nm, (c) Ta 5nm/Cu 25nm/Ta 5nm/Cu 5nm oraz (d) Ta 5nm/Cu 25nm/Ta 5nm/NiFe 2nm/Cu 5nm w celu poprawy tekstury złącza. Na złaczach wygrzanych w próżni w temperaturze 275°C wykonano pomiary dyfrakcyjne: pomiar &Theta-2&Thetaž, pomiar &omega (rocking curve) oraz pomiar figur biegunowych w celu wyznaczenia korelacji pomiedzy tekstura a magnetycznym sprzężeniem wymiennym pomiedzy warstwami IrMn i CoFe. Stopień steksturowania złącza zależy od materiałów zastosowanych na warstwy buforowe jak również od sekwencji ich ułożenia. Najsilniejszą teksturę otrzymano dla bufora typu (b) z warstwą Ta naniesioną bezposrednio na podłoże. Warstwy rosną w postaci kolumn, które generują szorstkości. Z korelacji pomiarów magnetycznych oraz pomiaru rocking curve otrzymano, że wymienne sprzężenie magnetyczne typu exchange bias miedzy warstwami CoFe i IrMn oraz pole koercji wzrastają dwukrotnie w przypadku użycia silnie steksturowanego bufora (b). Wybór własciwego układu warstw buforowych pozwala na optymalizacje sprzężenia exchange bias w wielowarstwowych urządzeniach magnetoelektroniki.

14

Analysis of absorptive damper effect on noise reduction

Ondrouch J., Kanak J., Bilosova A.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2004

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z. 25

109-114

EN

A frequent case of application of vibration and noise damper on rotational machine parts is the use of an absorptive damper. The effect of such a damper shaped as an annular plate is not only on damping vibrations, but it acts in complex manner. In addition to suppressing vibrations, it acoustically shades the eradiation surface of the noise source and it draws negatively by its own acoustic eradiation. The paper analyses the influence of various modifications of dampers.

PL

Tłumik absorpcyjny jest często stosowany w częściach obrotowych maszyn w celu tłumienia drgań i hałasu. Działanie takiego tłumika ukształtowanego jako tarcza kołowa jest złożone i nie ogranicza się tylko do tłumienia drgań. W artykule poddano analizie wpływ różnych modyfikacji tłumika na jego efektywność.

15

Time vs. frequency domain for damping measurements

Ondrouch J., Kanak J., Bilosova A.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2003

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z. 22

79-82

EN

The paper deals with two methods of measuring mechanical systems' damping based on Fast Fourier Transform (FFT). The method based on evaluation of damping from vibration decay in time domain is compared to the method based on evaluation of damping from the measured frequency response functions. The comparison of measurement results is carried out and advantages and disadvantages of both methods in estimation of damping for both lightly and heavily damped mechanical systems are evaluated.

16

Structure analysis and local magnetic parameters of magnetoresistance tunnel junctions

Kim C., Kim C. O., Hu Y., Kanak J., Stobiecki T., Ogata S., Tsunoda M., Takahashi M.

Materials Science

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2003

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Vol. 21, No. 1

9-23

EN

The Magnetoresistance Tunnel Junctions (MTJ) were deposited by DC magnetron sputtering method in the following layer sequence: Ta(50A)/Cu(100A)/Ta(50A)/Ni80Fe20(20A)/Cu(50A)/Mn75Ir25(100A)/Co70Fe30(25A)/Al-O/Co70Fe30(25A)/Ni80Fe20(t) /Ta(50A)/, with t = 0A, 100A and 1000A. X-ray diffraction analysis revealed that highly oriented fcc-(111) of IrMn3, Cu, Ni80Fe20 and Co70Fe30 crystal planes are stacked parallel to the substrate plane. The improvement of (111) texture and crystallinity was observed after annealing. The tunneling magnetoresistance ratio of patterned junction with electrode layer of Ni80Fe20 (t = 1000A), deposited on the free layer of Co70Fe30 (25A) exceeds 40% at room temperature after annealing at 200°C in magnetic field 1kOe. The local hysteresis loops were measured using the magneto-optical Kerr effect system. The relatively irregular variations of coercive force Hc and unidirectional anisotropy field Hua in as-deposited sample are revealed. After 200°C annealing Hc decreases but Hua increases with smooth local variations. Two-dimensional plots of Hc and Hua show the symmetric saddle shapes with their axes aligned with the pinned layer. The distribution of surface roughness is symmetric with respect to the center of MTJ. Correlation between surface roughness and the variation of Hua suggests that the Hua variation of the free layer is well described by dipole interactions in the form of socalled Néel "orange peel" coupling.

17

Experimentalni overeni vlivu tlumicu vibraci na hladinu akustickych emisi

Ondrouch J., Kanak J.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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2000

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z. 12

71-74

EN

In this paper, an experiment is described, which was carried out with the aim of acoustic emission assessment while vibrations are reduced with the use of vibration dampers. The measurement method and measurement set-up are briefly stated here. An assessment of the influence of selected types of dampers to the acoustic emission level was done according to chosen criteria, in comparison with the test specimen without damper.

18

Experimentalni overeni vlivu tlumice kmitu na uroven akustickych emisi

Ondrouch J., Kanak J.

Zeszyty Naukowe Katedry Mechaniki Stosowanej / Politechnika Śląska

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1999

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z. 11

57-60

EN

The paper deals with the experiment, which was carried out in order to evaluate the acoustic emission level while vibration is reduced by means of vibration absorbers. The measurement methodology and the measurement set-up are briefly stated here. On the base of the suggested criteria, evaluation of the influence of certain types of absorbers on the ovcertain types of absorbers on the overal acoustic emission level in comparison with a nondamped system is carried out.