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1

Physical Modelling of the Production of an Alloy Vapour Source for the Synthesis of Dielectric Material

Nadolski M., Stradomski G., Zdunek K., Okrasa S.

Archives of Metallurgy and Materials

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2020

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Vol. 65, iss. 1

201--206

EN

The paper reports the results of a physical modelling study of the production of a hypereutectic aluminium alloy to be used formaking an alloy vapour source for operation in the magnetron. Within the study, targets from a hypereutectic aluminium-silicon alloy were made in laboratory conditions. Thus obtained material was subjected to heat treatment, porosity analysis, and the assessment of the microstructure and fitness for being used in the magnetron. The process of melting the hypereutectic Al-Si alloy was carried out at the Department of Foundry of the Czestochowa University of Technology. The investigation into the production of the alloy vapour source for the synthesis of the dielectric material from the hypereutectic aluminium alloy has confirmed.

2

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Strzelecki G. W., Nowakowska-Langier K., Chodun R., Okrasa S., Wicher B., Zdunek K.

Materials Science Poland

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2018

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Vol. 36, No. 4

697--703

EN

The research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

3

Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering

Wicher B., Chodun R., Nowakowska-Langier K., Okrasa S., Król K., Minikayev R., Strzelecki G., Zdunek K.

Archives of Metallurgy and Materials

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2018

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Vol. 63, iss. 3

1339--1344

EN

This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.

4

Multi-sided metallization of textile fibres by using magnetron system with grounded cathode

Chodun R., Wicher B., Skowroński Ł., Nowakowska-Langier K., Okrasa S., Grabowski A., Minikayev R., Zdunek K.

Materials Science Poland

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2017

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Vol. 35, No. 3

639--646

EN

The synthesis of coatings on textiles fibers enables functionalization of their properties e.g.: changing the reaction on IR radiation. In our experiment, a magnetron with a grounded cathode and positively biased anode was used as a source of plasma. A ring anode was positioned at 8 cm distance from the cathode. Samples of glass and cotton textile were placed at the plane of the anode. Ti and TiN coatings were deposited by sputtering of titanium target in Ar or Ar+ N2 atmosphere. SEM studies showed that, using the magnetron system described above, the textile fibers were covered by the 2 μm to 3 μm thick coatings. Unexpectedly, the coatings were deposited at both sides of the samples: the front side was exposed to glow discharge plasma and the backside was completely shaded from the plasma. IR optical investigation exhibited significant change in reflectance and transmittance of the coated textiles. The using of standard magnetron system (grounded anode and cathode at negative potential) resulted in a coating deposition at the textile side exposed to the plasma action only. We believe that the multi-sided deposition of coatings observed during the process run with magnetron with grounded cathode is a result of an ambipolar diffusion mechanism in the anodic potential drop region.

5

The role of magnetic energy on plasma localization during the glow discharge under reduced pressure

Chodun R., Nowakowska-Langier K., Zdunek K., Okrasa S.

Nukleonika

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2016

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Vol. 61, No. 2

191--194

EN

In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).

6

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

Chodun R., Nowakowska-Langier K., Okrasa S., Zdunek K.

Materials Science Poland

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2016

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Vol. 34, No. 1

126--131

EN

This work presents the very first results of the application of plasma magnetic filtering achieved by a coil coupled with an electrical circuit of a coaxial accelerator during the synthesis of AlN thin films by use of Impulse Plasma Deposition method (IPD). The uniqueness of this technical solution lies in the fact that the filter is not supplied, controlled and synchronized from any external device. Our solution uses the energy from the electrical circuit of plasma accelerator. The plasma state was described on the basis of OES studies. Estimation of the effects of plasma filtering on the film quality was carried out on the basis of characterization of structure morphology (SEM), phase and chemical composition (vibrational spectroscopy). Our work has shown that the use of the developed magnetic self-filter improved the structure of the AlN coatings synthesized under the condition of impulse plasma, especially by the minimization of the tendency to deposit metallic aluminum droplets and columnar growth.

7

Novel GIMS technique for deposition of colored Ti/TiO2 coatings on industrial scale

Zdunek K., Skowronski L., Chodun R., Nowakowska-Langier K., Grabowski A., Wachowiak W., Okrasa S., Wachowiak A., Strauss O., Wronkowski A., Domanowski P.

Materials Science Poland

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2016

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Vol. 34, No. 1

137--141

EN

The aim of the present paper has been to verify the effectiveness and usefulness of a novel deposition process named GIMS (Gas Injection Magnetron Sputtering) used for the first time for deposition of Ti/TiO2 coatings on large area glass substrates covered in the condition of industrial scale production. The Ti/TiO2 coatings were deposited in an industrial system utilizing a set of linear magnetrons with the length of 2400 mm each for covering the 2000 x 3000 mm glasses. Taking into account the specific course of the GIMS (multipoint gas injection along the magnetron length) and the scale of the industrial facility, the optical coating uniformity was the most important goal to check. The experiments on Ti/TiO2 coatings deposited by the use of GIMS were conducted on substrates in the form of glass plates located at the key points along the magnetrons and intentionally non-heated during any stage of the process. Measurements of the coatings properties showed that the thickness and optical uniformity of the 150 nm thick coatings deposited by GIMS in the industrial facility (the thickness differences on the large plates with 2000 mm width did not exceed 20 nm) is fully acceptable form the point of view of expected applications e.g. for architectural glazing.

8

Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Zdunek K., Nowakowska-Langier K., Chodun R., Dora J., Okrasa S, Talik E.

Materials Science Poland

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2014

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Vol. 32, No. 2

171—175

EN

In 2011, we proposed a novel magnetron sputtering method. It involved the use of pulsed injection of working gas for the initiation and control of gas discharge during reactive sputtering of an AlN layer (Gas Injection Magnetron Sputtering – GIMS). Unfortunately, the presence of Al–Al bonds was found in XPS spectra of the AlN layers deposited by GIMS onto Si substrate. Our studies reported in this paper proved that the synchronization of time duration of the pulses of both gas injection and applied voltage, resulted in the elimination of Al–Al bonds in the AlN layer material, which was confirmed by the XPS studies. In our opinion the most probable reason of Al–Al bonds in the AlN layers deposited by the GIMS was the self-sputtering of the Al target in the final stage of the pulsed discharge.

9

Zastosowanie metody IPD do syntezy warstw c-AlN

Chodun R., Nowakowska-Langier K., Okrasa S., Firek P., Szmidt J., Zdunek K.

Elektronika : konstrukcje, technologie, zastosowania

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2014

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Vol. 55, nr 10

11-13

PL

Azotek aluminium otrzymywany w postaci warstw wzbudza duże zainteresowanie ze względu na swoje właściwości dielektryczne. Typowym produktem syntezy warstw AlN metodami inżynierii powierzchni jest odmiana stabilna h-AlN. Ostatnio zwraca się uwagę na warstwy AlN syntetyzowane w odmianie kubicznej. W artykule opisane zostały badania dotyczące wykorzystania metody IPD do wytwarzania cienkich warstw azotku. Metodą tą uprzednio syntetyzowane były takie materiały, jak: DLC, czy e-BN. Na podstawie badań XRD oraz spektroskopii ramanowskiej warstw AlN wytwarzanych w pracy metodą IPD wykazano, że produktem syntezy jest odmiana kubiczna azotku.

EN

Recently, aluminum nitride (AlN) has attracted much attention due to its electric properties. Typically the AlN that is obtained by using the plasma surface engineering method crystallizes in stable, hexagonal structure. However, it can also be grown in cubic structure. The article describes the research concerning the use of the IPD method to synthesis of thin nitride layers. This method was previously used to synthesis of layers materials such as DLC or e-BN. On the basis of the X-ray diffraction and Raman spectroscopy of the AlN layers produced by the IPD method we demonstrated that, a cubic AlN was synthesized.