Wyniki wyszukiwania - BazTech

Ograniczanie wyników

2 Metrology and Measurement Systems

Znaleziono wyników: 2

Liczba wyników na stronie

Wyniki wyszukiwania

Sortuj według:

Ogranicz wyniki do:

Metrology and control of electromagnetically actuated cantilevers using optical beam deflection method

Kopiec Daniel, Majstrzyk Wojciech, Pruchnik Bartosz, Gacka Ewelina, Badura Dominik, Sierakowski Andrzej, Janus Paweł, Gotszalk Teodor

Metrology and Measurement Systems

2021

Vol. 28, nr 4

627--642

In this paper, we present metrology and control methods and techniques for electromagnetically actuated microcantilevers. The electromagnetically actuated cantilevers belong to the micro electro mechanical systems (MEMS), which can be used in high resolution force and mass change investigations. In the described experiments, silicon cantilevers with an integrated Lorentz current loop were investigated. The electromagnetically actuated cantilevers were characterized using a modified optical beam deflection (OBD) system, whose architecture was optimized in order to increase its resolution. The sensitivity of the OBD system was calibrated using a reference cantilever, whose spring constant was determined through thermomechanical noise analysis registered interferometrically. The optimized and calibrated OBD system was used to observe the resonance and bidirectional static deflection of the electromagnetically deflected cantilevers. After theoretical analysis and further experiments, it was possible to obtain setup sensitivity equal to 5.28 mV/nm.

A method of magnetic field measurement in a scanning electron microscope using a microcantilever magnetometer

Orłowska Karolina, Mognaschi Maria E., Kwoka Krzysztof, Piasecki Tomasz, Kunicki Piotr, Sierakowski Andrzej, Majstrzyk Wojciech, Podgórni Arkadiusz, Pruchnik Bartosz, di Barba Paolo, Gotszalk Teodor

Metrology and Measurement Systems

2020

Vol. 27, nr 1

141--149

Scanning electron microscopy (SEM) is a perfect technique for micro-/nano-object imaging [1] and movement measurement [2, 3] both in high and environmental vacuum conditions and at various temperatures ranging from elevated to low temperatures. In our view, the magnetic field expanding from the pole-piece makes it possible to characterize the behaviour of electromagnetic micro- and nano-electromechanical systems (MEMS/NEMS) in which the deflection of the movable part is controlled by the electromagnetic force. What must be determined, however, is the magnetic field expanding from the e-beam column, which is a function of many factors, like working distance (WD), magnification and position of the device in relation to the e-beam column. There are only a few experimental methods for determination of the magnetic field in a scanning electron microscope. In this paper we present a method of the magnetic field determination under the scanning electron column by application of a silicon cantilever magnetometer. The micro-cantilever magnetometer is a silicon micro-fabricated MEMS electromagnetic device integrating a current loop of lithographically defined dimensions. Its stiffness can be calibrated with a precision of 5% by the method described by Majstrzyk et al. [4]. The deflection of the magnetometer cantilever is measured with a scanning electron microscope and thus, through knowing the bias current, it is possible to determine the magnetic field generated by the e-beam column in a defined position and at a defined magnification.