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Surface magnetic anisotropy of Co Hf thin films

Lim W. Y., Baek J. S., Kim Y. Y., Lee S. J., Yu S. C., Lee S. H.

Electron Technology

1998

Vol. 31, No. 1

60-64

In order to investigate the effect of Hf content and the thickness of Co₁₀₀₋xHfx (x=16,24, 32 at.%) films we observed the absorption lines of spin wave resonance through the ferromagnetic resonance (FMR) measurement. One volume spin wave mode and surface spin wave models were observed for all the samples because the surface anisotropy constants of both sides of the films areless than zero. When the annealing temperature for Co84Hf16 film increased up to 225°C the surface magnetic anisotropy constant Ks2 of the film-substrate interface decreased from -0,07 erg/cm² to -0.32 erg/cm² and the Ks1 constant Ks2 of the film-air interface varied from 0.18 erg/cm² to -47 erg/cm². In Co76Hf24 film Ks2 decreased a little from -0.31 erg/cm² to -0.41 erg/cm² and Ks1 decreased rapidly from -0.19 erg/cm² to-0.60 erg/cm². In genearal it is shown that the surface anisotropy at the film-air interface is very sensitive to Hf content and annealing temperature. This result is due to the increase of Co content caused by oxidation of Hf atoms near the film-air interface during low temperature annealing (150~175°C) and the diffusion of Co atoms during high temperature annealing (200~220°C).