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1 2004

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Thin-film-silicon solar cells

Carabe J., Gandia J.

Opto-Electronics Review

2004

Vol. 12, No. 1

1--6

The traditional development of photovoltaics has been based on crystalline-silicon wafer technology. In the early 1970’s, however, a new approach arises based on the possibility to grow silicon in the form of a thin film onto a given substrate. Several techniques are used for such a deposition, among which plasma-enhanced chemical vapour deposition (PECVD) is clearly outstanding given its widespread use and success. More recently, very-high-frequency (VHP PECVD) and hot-wire CVD have appeared as very promising and fast developing alternatives with important potential and actual advantages. Thin-film technology introduces completely novel concepts and challenges in silicon photovoltaics. Low-temperature processes particularly adequate for large-area devices open up not only very important cost-reduction potential, but also new possibilities such as making semi-transparent or flexible modules. Additional important features are a highly automated production system, an enormous potential for building integration, a good performance at realistic working temperatures (around 40 C) and an excellent durability in outdoor conditions among others. Photovoltaics are facing important challenges for the near future. Silicon-wafer technology is evolving towards making thinner, cheaper, multicrystalline silicon. Thin-film-silicon researchers are in turn striving to make thicker, better, more crystalline films. Both ways seem to converge to new-generation photovoltaics in which wafer and thin-film technologies may be used in a synergistic rather than competing manner. Silicon heterojunction cells (made up of a crystalline silicon absorber onto which one or more thin-film silicon layers are deposited), such as the well-known HIT cell, are in the forefront of photovoltaics and may represent a breakthrough in the next few years.