The Role of Complementary Potential in Plasma Nitriding Processes of Technical Titanium

• Autorzy: Pilarska M. , Frączek T. , Maźniak K.

Identyfikatory

DOI

10.24425/amm.2018.125087

• Języki publikacji: EN

Abstrakty

EN

This article deals with the testing of surface layers produced on technical titanium Ti99.2 under glow discharge conditions. In order to determine the effect of process temperature on the produced surface layers, nitriding processes were carried out at 700°C and 800°C and for 3 and 5 hours. The research results on evaluating the properties of the obtained surface layers and the characterization of their morphology were presented. The impact of the adopted nitriding process variant on the quality of the obtained layers was evaluated. It was demonstrated that the use of the supplementary potential during the ion nitriding process reduces the unwanted edge effect, which results in a significant increase in the homogeneity of the nitrided layers and improves the functional properties of the technical titanium Ti99.2.

Słowa kluczowe

EN

plasma nitriding; active screen; titanium; ion nitriding

• Wydawca: Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences
• Czasopismo: Archives of Metallurgy and Materials
• Rocznik: 2018
• Tom: Vol. 63, iss. 4
• Strony: 1637--1642
• Opis fizyczny: Bibliogr. 19 poz., fot., rys., tab.

Twórcy

autor

Pilarska M.

• Czestochowa University of Technology, Faculty of Production Engineering and Materials Technology, 19 Armii Krajowej Av., 42-200 Częstochowa, Poland

autor

Frączek T.

• Czestochowa University of Technology, Faculty of Production Engineering and Materials Technology, 19 Armii Krajowej Av., 42-200 Częstochowa, Poland

autor

Maźniak K.

• Czestochowa University of Technology, Faculty of Production Engineering and Materials Technology, 19 Armii Krajowej Av., 42-200 Częstochowa, Poland

Bibliografia

• [1] V. V. Budilov, K. N. Ramazanov, I. V. Zolotov, R. F. Khucnutdinov, S. V. Starovoitov, J.Eng.Sci.Tech.Rev. 8 (6), 22-24 (2015).
• [2] K. Tokaji, T. Ogawa, H. Shibata, J. Mater. Eng. Perform. 8 (2), 159-167 (1999).
• [3] A. Zhecheva, W. Sha, S. Malinov, A. Long, Surf. Coat. Tech. 200 (7), 2192-2207 (2005).
• [4] Y. Tamura, A. Yokoyama, F. Watari, M. Uo, T. Kawasaki, Mater. Trans. 43 (12), 3034-3061 (2002).
• [5] F. J. Gil, R. Canedo, A. Padros, E. Sada, J. Biomater. Appl. 17 (1), 31-43 (2002).
• [6] O. Gul, N. Y. Sari, T. Sinmazcelik, Acta. Phys. Pol. A. 125 (2), 491-493 (2014).
• [7] T. Morita, H. Takahashi, M. Shizumu, K. Kawasaki, Fatigue Fract. Eng. Mater. Struct. 20 (1), 85-92 (1997).
• [8] T. Frączek, M. Olejnik, Metalurgija 52 (1), 79-82 (2013).
• [9] A. Edrisy, K. Farokhzadeh, Plasma Nitriding of Titanium Alloys. Plasma Science and Technology - Progress in Physical States and Chemical Reactions (2016).
• [10] H. Yilmazer, S. Yilmaz, M. E. Acma, Deffect Diffusion Forum 283-286, 401-405 (2009).
• [11] C. Zhao, C. X. Li, H. Dong, T. Bell, Surf. Coat. Tech. 201, 2320-2325 (2006).
• [12] S. C. Gallo, H. Dong, Vacuum 84, 321-325 (2010).
• [13] M. Betiuk, S. Mater. Eng. 4 (31), 869-873 (2010).
• [14] K. Maźniak PhD thesis, Ion nitriding of titanium with complementary potential using an active screen, Czestochowa University of Technology, Czestochowa (2016).
• [15] C. X. Li, T. Bell Heat Treat. Met. 1, 1-7 (2003).
• [16] J. W. Nah, B. J. Kim, D. K. Lee, J. J. Lee, J. Vac. Sci. Technol. A 17 (2), 463-469 (1999).
• [17] M. Ossowski, T. Borowski, M. Tarnowski, T. Wierzchoń, Mater. Sci-Medzg. 22 (1), 25-30 (2016).
• [18] M. Ossowski, M. Tarnowski, T. Borowski, A. Brojanowska, T. Wierzchoń, Mater. Eng. 4, 236-239 (2012).
• [19] T. Fraczek, Niekonwencjonalne niskotemperaturowe azotowanie jarzeniowe materiałów metalicznych. Wydawnictwo WIPMiFS, Częstochowa 2011.

Uwagi

PL

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018).