Wpływ dodatkowego pola magnetycznego podczas napylania magnetronowego na efekt GMR w strukturach cienkowarstwowych

• Autorzy: Kisała Jakub

Identyfikatory

DOI

10.15199/48.2022.01.42

Warianty tytułu

EN

Influence of an additional magnetic field during magnetron sputtering on the GMR effect in thin-film structures

• Języki publikacji: PL

Abstrakty

PL

W artykule wskazano zasadność badań nad technologią struktur wykazujących zjawisko gigantycznego magnetooporu. Przedstawiono proces napylania magnetronowego oraz sposoby ukierunkowania namagnesowań warstw ferromagnetycznych w strukturach cienkowarstwowych. W wyniku przeprowadzonych pomiarów rezystancji otrzymanych struktur potwierdzono wpływ zastosowania zewnętrznego pola magnetycznego podczas napylania warstw ferromagnetycznych na powtarzalność zjawiska gigantycznego magnetooporu.

EN

The article shows the validity of research of structures showing the phenomenon of giant magnetoresistance. Magnetron sputtering process and methods of inducing direction of magnetization of ferromagnetic layers in thin-film structures are presented. As a result of the resistance measurements of structures, the influence of the application of an external magnetic field during ferromagnetic layers sputtering process on the repeatability of the giant magnetoresistance effect was confirmed.

Słowa kluczowe

PL

gigantyczny magnetoopór; napylanie magnetronowe; struktura cienkowarstwowa; statyczne pole magnetyczne

EN

giant magnetoresistance; magnetron sputtering; thin-film structures; static magnetic field

• Wydawca: Wydawnictwo SIGMA-NOT
• Czasopismo: Przegląd Elektrotechniczny
• Rocznik: 2022
• Tom: R. 98, nr 1
• Strony: 192--195
• Opis fizyczny: Bibliogr. 29 poz., rys.

Twórcy

autor

Kisała Jakub

• Politechnika Lubelska, Wydział Elektrotechniki i Informatyki, ul. Nadbystrzycka 38B, 20-618 Lublin

• https://orcid.org/000-0002-4898-3670

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