Polarization-independent metal-dielectric grating with improved bandwidth

• Autorzy: Wang B , Li H , Shu W , Li W , Li C , Lei L , Zhou J

Identyfikatory

DOI

10.5277/oa150107

• Języki publikacji: EN

Abstrakty

EN

A polarization-independent reflective grating with improved bandwidth is presented based on the mixed metal-dielectric grating. The novel grating is composed of the substrate, the metal slab, two dielectric layers, and the covering layer. The grating parameters are optimized for the special duty cycle of 0.6 at an incident wavelength of 1550 nm used in dense wavelength division multiplexing (DWDM). With the designed grating, high efficiency can be diffracted into the reflective –1st order for both TE and TM polarizations, where the polarization-independence is exhibited. Most importantly, the efficiency of more than 90% can be achieved within the incident wavelength bandwidth of 1262–1686 nm, where the bandwidth is improved greatly compared with the reported surface-relief single-layer grating. The reflective grating can have advantages of high efficiency, polarization-independence, and wide bandwidth, which should be useful for DWDM applications.

Słowa kluczowe

EN

rigorous coupled-wave analysis; reflective efficiency; improved bandwidth

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2015
• Tom: Vol. 45, nr 1
• Strony: 71--77
• Opis fizyczny: Bibliogr. 15 poz., rys.

Twórcy

autor

Wang B

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Li H

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Shu W

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Li W

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Li C

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Lei L

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

autor

Zhou J

• School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China

Bibliografia

• [1] XUFENG JING, SHANGZHONG JIN, YING TIAN, PEI LIANG, QIANMIN DONG, LE WANG, Analysis of the sinusoidal nanopatterning grating structure, Optics and Laser Technology 48, 2013, pp. 160–166.
• [2] SEN JIA, LIHE YAN, JINHAI SI, WENHUI YI, FENG CHEN, XUN HOU, Subwavelength beam focusing by multiple-metal slits surrounded by chirped dielectric surface gratings, Optics Communications 285(6), 2012, pp. 1519–1522.
• [3] CHENYING YANG, WEIDONG SHEN, YUEGUANG ZHANG, DING ZHAO, XU LIU, Multi-narrowband absorber based on subwavelength grating structure, Optics Communications 331, 2014, pp. 310–315.
• [4] ANSBAEK T., IL-SUG CHUNG, SEMENOVA E.S., YVIND K., 1060-nm tunable monolithic high index contrast subwavelength grating VCSEL, IEEE Photonics Technology Letters 25(4), 2013, pp. 365–367.
• [5] SAASTAMOINEN T., LAJUNEN H., Increase of spatial coherence by subwavelength metallic gratings, Optics Letters 38(23), 2013, pp. 5000–5003.
• [6] KANAMORI Y., OKOCHI M., HANE K., Fabrication of antireflection subwavelength gratings at the tips of optical fibers using UV nanoimprint lithography, Optics Express 21(1), 2013, pp. 322–328.
• [7] ARRIOLA A., RODRIGUEZ A., PEREZ N., TAVERA T., WITHFORD M.J., FUERBACH A., OLAIZOLA S.M., Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors, Optical Materials Express 2(11), 2012, pp. 1571–1579.
• [8] BIN YU, WEI JIA, CHANGHE ZHOU, HONGCHAO CAO, WENTING SUN, Grating imaging scanning lithography, Chinese Optics Letters 11(8), 2013, article 080501.
• [9] JIJUN FENG, CHANGHE ZHOU, JIANGJUN ZHENG, HONGCHAO CAO, PENG LV, Design and fabrication of a polarization-independent two-port beam splitter, Applied Optics 48(29), 2009, pp. 5636–5641.
• [10] BO WANG, LI CHEN, LIANG LEI, JINYUN ZHOU, Two-layer dielectric grating as two-port beam splitter, IEEE Photonics Technology Letters 25(9), 2013, pp. 863–866.
• [11] LOCHBIHLER H., YAN YE, Two-dimensional subwavelength gratings with different frontside/backside reflectance, Optics Letters 38(7), 2013, pp. 1028–1030
• [12] YANYAN ZHANG, CHANGHE ZHOU, High-efficiency reflective diffraction gratings in fused silica as (de)multiplexers at 1.55 μm for dense wavelength division multiplexing application, Journal of the Optical Society of America A 22(2), 2005, pp. 331–334.
• [13] SHUNQUAN WANG, CHANGHE ZHOU, YANYAN ZHANG, HUAYI RU, Deep-etched high-density fused-silica transmission gratings with high efficiency at a wavelength of 1550 nm, Applied Optics 45(12), 2006, pp. 2567–2571.
• [14] MOHARAM M.G., GAYLORD T.K., POMMET D.A., GRANN E.B., Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach, Journal of the Optical Society of America A 12(5), 1995, pp. 1077–1086.
• [15] SHIOZAKI M., SHIGEHARA M., Novel design of polarization independent multi-layer diffraction grating with high angular dispersion, SEI Technical Review 59, 2005, pp. 27–31.