A note on optical materials for photolithography applications

Jain, A.; Roszkiewicz, A.; Nasalski, W.

Artykuł - szczegóły

Tytuł artykułu

A note on optical materials for photolithography applications

Autorzy

Jain A. , Roszkiewicz A. , Nasalski W.

Treść / Zawartość

Pełne teksty:

IPPT_Reports_2018_3_Amrita_Jain_Agata_Roszkiewicz_Wojciech Nasalski_online_17_October_2018.pdf

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Warianty tytułu

Języki publikacji

Abstrakty

Optical lithography or photolithography is well-established optical tool for patterning of substrates, layers or photonic crystals. Therefore, the materials involved in these processes play an important role, especially for the possibility of their further advancements and optimisation. In this review article, we discuss on the role and significance of photoresist materials from various perspectives like their performance in photonic applications and their dependence on various physical and chemical parameters. Further, several emerging now two-dimensional materials like graphene has also been discussed from photonic point of view. We aim to give a short overview of recent developments of such materials in this field.

Fotolitografia jest dobrze znanym procesem pozwalającym na tworzenie wzorów na podłożach, warstwach czy kryształach fotonicznych. W związku z tym materiały wykorzystywane w tym procesie pełnią istotną rolę, zwłaszcza ze względu na dalszy możliwy rozwój dziedziny oraz optymalizację procesu. W tym artykule przeglądowym omawiamy rolę i znaczenie fotorezystu z różnych perspektyw, np. jego wydajność w zastosowaniach fotonicznych czy zależność od różnych parametrów fizycznych i chemicznych. Ponadto, omawiamy wiele powstających obecnie dwuwymiarowych materiałów, jak grafen, z punktu widzenia fotoniki. Naszym celem jest przedstawienie krótkiego przeglądu ostatnich osiągnięć w dziedzinie tego typu materiałów wykorzystywanych w fotolitografii.

Słowa kluczowe

optical lithography photoresist graphene photonic

fotolitografia fotorezyst grafen fotonika

Wydawca

Instytut Podstawowych Problemów Techniki PAN

Czasopismo

IPPT Reports on Fundamental Technological Research

Rocznik

2018

Tom

nr 3

Strony

1--41

Opis fizyczny

Bibliogr. 63 poz., rys., tab.

Twórcy

autor

Jain A.

Institute of Fundamental Technological Research, Polish Academy of Sciences

autor

Roszkiewicz A.

Institute of Fundamental Technological Research, Polish Academy of Sciences

autor

Nasalski W.

Institute of Fundamental Technological Research, Polish Academy of Sciences

Bibliografia

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Uwagi

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2019).

Typ dokumentu

Bibliografia

Identyfikator YADDA

bwmeta1.element.baztech-f6fe24c4-55e0-478e-bda0-6b641c2aa4ac