Removal of Nitramine Explosives in Aqueous Solution by UV-Mediated Advanced Oxidation Process in Near-Neutral Conditions

• Autorzy: Khue Do Ngoc , Bach Vu Quang , Binh Nguyen Thanh , Minh Do Binh , Nam Pham Thi , Loi Vu Duc , Nguyen Hoa Thanh

Identyfikatory

DOI

10.12911/22998993/137074

• Języki publikacji: EN

Abstrakty

EN

Explosive compounds are hazardous to the environment, posing a serious risk to human and animal health and the ecosystem. The primary goal of research was to compare the efficiency of UV/H₂O₂, photo-Fenton, electro (EO)/ UV/H₂O₂ processes at near-neutral pH (pH=6) on the degradation of nitramine explosives (NAs), such as hexogen (RDX), octogen (HMX), and tetryl (TET), in an aqueous solution. The effect of operational conditions, likely pH of the solution, initial H₂O₂ concentration, initial Fe²⁺ concentration, and solution temperature, was observed. The removal kinetics fit with first-order kinetics and were in the order: photo-Fenton >EO/UV/ H₂O₂ > UV/ H₂O₂. The results showed higher rate constant values for TET, RDX and HMX removal by UV/ H₂O₂ (k = 0.07778, 0.03791 and 0.03786 min^-1), EO/UV/ H₂O₂ (k = 0.16599, 0.1475 and 0.08674 min^-1) and photo-Fenton (k = 0.18018, 0.1501 and 0.09336 min^-1) processes. Furthermore, TET, RDX and HMX were mineralized at 59.7%, 45.1%, and 25.1 %, respectively, under optimum conditions after 60 min of the photo-Fenton process. From the economic perspective, photo-Fenton only requires 2.132–4.113 kWh m^-3 to completely reduce NAs. Finally, acute toxicity towards Vibrio fischeri was defeated after usage of near-neutral photo-Fenton. Thus, photo-Fenton at circum-neutral is promising for low-cost, eco-friendly and efficient processes for treating nitramine explosives in aqueous solutions.

Słowa kluczowe

EN

hexogen; octogen; tetryl; UV; photo-Fenton; electrooxidation; near neutral

• Wydawca: Polskie Towarzystwo Inżynierii Ekologicznej ; Lublin University of Technology
• Czasopismo: Journal of Ecological Engineering
• Rocznik: 2021
• Tom: Vol. 22, nr 6
• Strony: 232--243
• Opis fizyczny: Bibliogr. 30 poz., rys., tab.

Twórcy

autor

Khue Do Ngoc

• Institute of New Technology, Academy of Military Science and Technology, 17 Hoang Sam str., Ha Noi, Viet Nam

autor

Bach Vu Quang

• Military Industrial College, 22/103 Ly Son str, Ngoc Thuy, Long Bien, Ha Noi, Viet Nam

autor

Binh Nguyen Thanh

• College of Chemical Defense Officer/Chemical Corps; Tan Phu, Son Tay dictrict, Ha Noi, Viet Nam

autor

Minh Do Binh

• Institute of New Technology, Academy of Military Science and Technology, 17 Hoang Sam str., Ha Noi, Viet Nam

autor

Nam Pham Thi

• Institute For Tropical Technology, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet str., Ha Noi, Viet Nam

autor

Loi Vu Duc

• Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet str., Ha Noi, Viet Nam

autor

Nguyen Hoa Thanh

• Thuyloi University, 175 Tay Son str., Dong Da, Ha Noi, Viet Nam

• https://orcid.org/0000-0001-8322-5202

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