PL EN


Preferencje help
Widoczny [Schowaj] Abstrakt
Liczba wyników
Tytuł artykułu

SiN/SiO2 passivation stack of n-type silicon surface

Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The SiN/SiO2 stack is widely used to passivate the surface of n-type monocrystalline silicon solar cells. In this work, we have undertaken a study to compare the stack layer obtained with SiO2 grown by both rapid thermal and chemical ways to passivate n-type monocrystalline silicon surface. By varying the plateau time and the plateau temperature of the rapid thermal oxidation, we determined the parameters to grow 10 nm thick oxide. Two-step nitric acid oxidation was used to grow 2 nm thick silicon oxide. Silicon nitride films with three refractive indices were used to produce the SiN/SiO2 stack. Regarding this parameter, the minority carrier lifetime measured by means of QSSPC revealed that the refractive index of 1.9 ensured the best passivation quality of silicon wafer surface. We also found that stacks with nitric acid oxidation showed definitely the best passivation quality. In addition to produce the most efficient passivation, this technique has the lowest thermal budget.
Słowa kluczowe
Wydawca
Rocznik
Strony
482--487
Opis fizyczny
Bibliogr. 22 poz., tab., rys.
Twórcy
autor
  • Research Center in Semiconductor Technology for Energetic, 02 Bd. Frantz Fanon-Alger, BP N°140, Les 07 Merveilles, 16038, Algiers, Algeria
  • Research Center in Semiconductor Technology for Energetic, 02 Bd. Frantz Fanon-Alger, BP N°140, Les 07 Merveilles, 16038, Algiers, Algeria
autor
  • Research Center in Semiconductor Technology for Energetic, 02 Bd. Frantz Fanon-Alger, BP N°140, Les 07 Merveilles, 16038, Algiers, Algeria
autor
  • Research Center in Semiconductor Technology for Energetic, 02 Bd. Frantz Fanon-Alger, BP N°140, Les 07 Merveilles, 16038, Algiers, Algeria
Bibliografia
  • 1] MAYET A.S., CANSIZOGLU H., GAO Y., GHANDIPARSI S., KAYA A., BARTOLO-PEREZ C., ALHALAILI B., YAMADA T., PONIZOVSKAYA DEVINE E., ELREFAIE A. F., WANG S-Y., SAIF ISLAM M., JOSA B, 5 (2018), 1059.
  • [2] EL AMRANI A., BEKHTARI A., EL KECHAI A., MENARI H., MAHIOU L., MAOUDJ M., SIKADDOUR R., Superlattices Microstruct., 73 (2014), 224.
  • [3] BALAJI N., LEE S., PARK C., RAJA J. , NGUYEN H.T.T., CHATTERJEE NIKESH S.K., JEYAKUMAR R., JUNSIN Y., RSC Adv., 6 (2016), 70040.
  • [4] GATZ S., PLAGWITZ H., ALTERMATT P.P., TERHEIDEN B., BRENDEL R., Proc. 23rd EUPVSEC, Valencia, Spain, 2008 (2008), 1033.
  • [5] KAMINSKI P.M., ABBAS A., BASS K., CLAUDIO G., Energy Procedia, 10 (2011), 71.
  • [6] LEBRETON F., Silicon surface passivation properties of aluminum oxide grown by atomic layer deposition for low temperature solar cells processes, Thesis, Université Paris-Saclay, 2017.
  • [7] HAMEIRI Z., BOROJEVIC N., MAI L., NANDAKUMAR N., KIM K., WINDERBAUM S., IEEE J Photovolt., 7 (4) (2017), 996.
  • [8] COTTER J. E., GUO J. H., COUSINS P. J., ABBOTT M. D., CHEN F. W., FISHER K. C., IEEE T. Electron. Dev., 53 (8) (2006), 1893.
  • [9] KIM K., DHUNGEL S. K., YOO J., JUNG S., MANGALARAJ D., YI J., J. Korean Phys. Soc., 51(5) (2007), 1659.
  • [10] CUEVAS A., KERR M. J., SCHMIDT J., Proc. 3rd World Conf. Photovolt. Energy Convers., (2003), 913.
  • [11] KERR M., CUEVAS A., Semicond. Sci. Technol., 17 (2) (2002), 166.
  • [12] ZHAO J., Sol. Energ. Mater. Sol. C., 82 (53) (2004), 53.
  • [13] RYU K., KIM S.-J., J. Korean Inst. Electr. Electron. Mater. Eng., 26 (1) (2013), 18.
  • [14] KIM W.B., MATSUMOTO T., KOBAYASHI H., J. Appl. Phys., 105 (2009), 103709-1.
  • [15] IMAMURA K., TAKAHASHI M. A., HIRAYAMA Y., IMAI S., KOBAYASHI H., J. Appl. Phys., 107 (2010), 054503.
  • [16] HU Y.-C., CHIU M.-H., WANG L., TSAI J.-L., Jpn. J. Appl. Phys., 49 (2) (2010), 022301-1.
  • [17] LARIONOVA Y., HARDER N.-P., BRENDEL R., Proc. 25th EUPVSEC/5thWorld Conf. Photovolt. Energy Convers., Valencia, Spain, 2010 (2010), 1143.
  • [18] LEGUIJT C., LÖLGEN P., EIKELBOOM J.A., WEEBER A.W., SCHUURMANS F.M., SINKE W.C., ALKEMADE P.F.A., SARRO P.M., MARÉE C.H.M., VERHOEF L.A., Sol. Energ. Mater. Sol. C., 40(4) (1995), 297.
  • [19] CHEN Z., PANG S.K., YASUTAKE K., ROHATGI A., J. Appl. Phys., 74 (1993), 2856.
  • [20] LIU C.P., CHANG M.W., CHUANG C.L., Curr. Appl. Phys., 14 (2014), 653.
  • [21] SCHMIDT J., KERR M., CUEVAS A., Semicond. Sci. Technol., 16 (2001), 164.
  • [22] MASSOUD H.Z., PLUMMER J.D., IRENE E.A., J. Electrochem. Soc., 132 (11) (1985), 2693.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-e0dde4b6-9ca6-4f0b-ac9a-1765fb17a0fd
JavaScript jest wyłączony w Twojej przeglądarce internetowej. Włącz go, a następnie odśwież stronę, aby móc w pełni z niej korzystać.