Dissolution Behavior of Metal Impurities and Improvement of Reclaimed Semiconductor Wafer Cleaning by Addition of Chelating Agent

• Autorzy: Ryu Keunhyuk , Kim Myungsuk , Roh Jaeseok , Lee Kun-Jae

Identyfikatory

DOI

10.24425/amm.2021.136409

• Języki publikacji: EN

Abstrakty

EN

As a wafer cleaning process, RCA (Radio Corporation of America) cleaning is mainly used. However, RCA cleaning has problems such as instability of bath life, re-adsorption of impurities and high-temperature cleaning. Herein, we tried to improve the purity of silicon wafers by using a chelating agent (oxalic acid) to solve these problems. Compounds produced by the reaction between the cleaning solution and each metal powder were identified by referring to the pourbaix diagram. All metals exhibited a particle size distribution of 10 μm or more before reaction, but a particle size distribution of 500 nm or less after reaction. In addition, it was confirmed that the metals before and after the reaction showed different absorbances. As a result of elemental analysis on the surface of the reclaimed silicon wafer cleaned through such a cleaning solution, it was confirmed that no secondary phase was detected other than Si.

Słowa kluczowe

EN

reclaimed silicon wafer; wafer cleaning; metal impurity; metal complex; chelating agent

• Wydawca: Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences
• Czasopismo: Archives of Metallurgy and Materials
• Rocznik: 2021
• Tom: Vol. 66, iss. 4
• Strony: 977--981
• Opis fizyczny: Bibliogr. 17 poz., fot., rys., tab., wzory

Twórcy

autor

Ryu Keunhyuk

• Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea

autor

Kim Myungsuk

• Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea

autor

Roh Jaeseok

• Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea

autor

Lee Kun-Jae

• Dankook University, Department of Energy Engineering, Cheonan 31116, Republic of Korea

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Uwagi

1. This work was supported by Korea Technology & Information Promotion Agency for SMEs (TIPA) grant funded by the Ministry of SMEs and Startups (MSS) (S2825750).

2. Opracowanie rekordu ze środków MNiSW, umowa Nr 461252 w ramach programu "Społeczna odpowiedzialność nauki" - moduł: Popularyzacja nauki i promocja sportu (2021).