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Functionalization of technical textile tapes

Wybrane pełne teksty z tego czasopisma
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Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Purpose: The aim of the study was to deposit a hydrophobic barrier coating on technical tapes in order to protect them from water and to test and assess the obtained products. Design/methodology/approach: The coatings were deposited on elastic, textile substrates using PACVD of hexamethyldisiloxane vapours with an RF commercial plasma system under reduced pressure. Findings: The coatings increased the hydrophobicity of the technical tapes, which was confirmed by high water contact angles and reduced water sorption by the tape. The polymerization of the monomer vapour plasma was achieved without carrier gas. With a relatively slow increase in the deposition, rough coatings were obtained on a submicroscopic level, as opposed to the commonly produced smooth ppHMDSO coatings. This rough character enhanced the hydrophobicity of the surface according to the Wetzel or Cassie models. The modification processes did not significantly affect the basic mechanical properties of the tapes, such as Young’s modulus and tensile strength. The ppHMDSO coatings are resistant to aging and mechanical wear and retain their hydrophobic barrier properties. Research limitations/implications: The quantitative assessment of the wettability of a substrate with a rough surface is difficult and often ambiguous. This element of physicochemical metrology is wide open for innovation. Practical implications: The use of this plasma technique to make textile barrier products shows several merits, such as an economically justifiable, pro-ecological and dry process. The hydrophobicity of the textile substrates can also be obtained using other monomers. Originality/value: The formation of local hierarchical structures on the top layer of the fabric surface enhance the hydrophobic effect.
Rocznik
Strony
72--84
Opis fizyczny
Bibliogr. 31 poz.
Twórcy
  • Department of Material and Commodity Sciences and Textile Metrology, Lodz University of Technology, ul. Żeromskiego 116, 90-570 Łódź, Poland
autor
  • Department of Material and Commodity Sciences and Textile Metrology, Lodz University of Technology, ul. Żeromskiego 116, 90-570 Łódź, Poland
Bibliografia
  • 1. L. Martinu, O. Zabeida, J.E. Klemberg Sapieha, Plasma-Enhanced Chemical Vapor Deposition of Functional Coatings, in: P.M. Martin (Ed.), Handbook of Deposition Technologies for Films and Coatings, Elsevier Inc., 2010, 392-465.
  • 2. Y. Hamedani, P. Macha, T.J. Bunning, R.R. Naik, M.C. Vasudev, Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future, in: S. Neralla (Ed.), Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices, INTECH Open Science, 2016, 247-280.
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  • 6. R.P. Mota, D. Galvao, S.F. Durrant, M.A.B. de Moraes, S.O. Dantas, M. Cantao, HMDSO plasma polymerization and thin film optical properties, Thin Solid Films 270 (1995) 109-113.
  • 7. K.H. Kale, S. Palaskar, Plasma Enhanced Chemical Vapor Deposition of Tetraethyloortosilicate and Hexamethyl-disiloxane on Polyester Fabrics Under Pulsed and Continuous Wave Discharge, Journal of Applied Polymer Science 125/5 (2012) 3996-4006.
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  • 13. S. Kurosawa, B.G. Choi, J.W. Parka, H. Aizawy, K.B. Shima, K. Yamamoto, Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films, Thin Solid Films 506-507 (2006) 176-179.
  • 14. A.J. Choudhury, J. Chutia, H. Kakati, S.A. Barve, A.R. Pal, N.S. Sarma, D. Chowdhury, D.S. Patil, Studies of radiofreąuency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior, Vacuum 84/11 (2010) 1327-1333.
  • 15. K. Li, O. Gabriel, J. Meichsner, Fourier transform infrared spectroscopy study of molecular structure formation in thin films during hexamethyldisiloxane decomposition in low pressure rf discharge, Journal of Physics D: Applied Physics 37 (2004) 588-594.
  • 16. A.M. Wrobel, M. Kryszewski, J. Gazicki, Oligomeric Products in Plasma=Polymerized Organosilicones Journal of Macromolecular Science Part A 20/N5 (1983) 583-618.
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  • 18. K.H. Kale, S.S. Palaskar, Structural studies of plasma polymers obtained in pulsed dielectric barrier discharge of TEOS and HMDSO on nylon 66 fabrics, The Journal of the Textile Institute 103 (2012) 1088¬1098.
  • 19. Y.-Y. Ji, Y.-C. Hong, S.-H. Lee, S.-D. Kim, S.-S. Kim, Formation of super-hydrophobic and water- repellency surface with hexamethyldisiloxane (HMDSO) coating on polyethyleneteraphtalate fiber by atmosperic pressure plasma polymerization, Surface and Coatings Technology 202 (2008) 5663¬5667
  • 20. N. De Geyter, R. Morent, S. Van Vlierberghe, P. Dubruel, C. Leys, E. Schacht, Plasma polymerization of siloxanes at atmospheric pressure, Surface Engineering 27 (2011) 627-633.
  • 21. E. Bertaux, E. Marec, Effects of siloxane plasma coating on the frictional properties of polyester and polyamide fabrics, Surface and Coatings Technology 204 (2009) 165-171.
  • 22. A.M. Sarmadi, T.H. Ying, F. Denes, HMDSO-plasma modification of plypropylene fabrics, European Polymer Journal 31 (1995) 847-857.
  • 23. S. Shahidi, M. Ghoranneviss, J. Wiener, B. Moazzenchi, H. Mortazavi, Effect of Hexamethyldisiloxane (HMDSO)/Nitrogen Plasma Polymerisation on the Anti Felting and Dyeability of Wool Fabric, Fibres and Textiles in Eastern Europe 22 (2014) 116-119.
  • 24. F.T. Peirce, The geometry of cloth structure, Journal of the Textile Institute Transactions 28/3 (1937) T45- T96, Published online: 05 Dec 2008.
  • 25. K. Schmidt-Szalowski, Z. Rżanek-Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak, Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions, Plasmas and Polymers 5/3-4 (2000) 173-190.
  • 26. D. Theirich, Ch. Soll, F. Leu, J. Engemann, Intermediate gas phase precursors during plasma CVD of HMDSO, Vacuum 71 (2003) 349-359.
  • 27. J. Tyczkowski (Ed.), Thin films of plasma polymers, WNT, Warszawa, 1990.
  • 28. C. Chaiwong, P. Rachtanapun, S. Sarapirom, D. Boonyawan, Plasma polymerization of hexamethyldisiloxane: Investigation of the effect of carrier gas related to the film properties, Surface and Coatings Technology 229 (2013) 12-17.
  • 29. J. Fang, H. Chen, X. Yu, Studies on Plasma Polymerization of Hexamethyldisiloxane in the Presence of Different Carrier Gases, Journal of Applied Polymer Science 80 (2001) 1434-1438.
  • 30. L. Zuri, M.S. Silverstein, M. Narkis, Organic- inorganic character of plasma-polymerized hexamethyldisiloxane, Journal of Applied Polymer Science 62 (1996) 2147-2154.
  • 31. E. Bormashenko, Progress in understanding wetting transitions on rough surfaces, Advances in Colloid and Interface Science 222 (2015) 92-103
Uwagi
Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018)
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-de6f1e74-ef93-4b09-a2b5-f0697e60198b
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