The Al₂O₃/TiO₂ double antireflection coating deposited by ALD method

• Autorzy: Szindler Marek , Szindler Magdalena M. , Orwat Justyna , Kulesza-Matlak Grażyna

Identyfikatory

DOI

10.24425/opelre.2022.141952

• Języki publikacji: EN

Abstrakty

EN

Al₂O₃/TiO₂ thin films were deposited onto monocrystalline silicon surfaces using an atomic layer deposition. Their surface morphology and optical properties were examined for their possible use in solar cells. The surface condition and chemical composition were characterized using a scanning electron microscope and the thickness was measured using a spectroscopic reflectometer. The refractive index and the reflection characteristics were determined. First, the optical properties of the Al₂O₃ thin filmand its influence on recombination in the semiconductor were examined. In this way, it can fulfil a double role in a solar cell. Since reflection reduction was only achieved in a narrow range, it was decided to use the Al₂O₃/TiO₂ system. Thanks to this solution, the light reflection was reduced in a wide range (even below 0.2%).

Słowa kluczowe

EN

antireflection coating; atomic layer deposition method; solar cells

• Wydawca: Stowarzyszenie Elektryków Polskich ; Polska Akademia Nauk ; Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Opto-Electronics Review
• Rocznik: 2022
• Tom: Vol. 30, No. 3
• Strony: art. no. e141952
• Opis fizyczny: Bibliogr. 17 poz., rys., wykr., tab.

Twórcy

autor

Szindler Marek

• Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, 7 Towarowa St., 44-100 Gliwice, Poland

• https://orcid.org/0000-0001-9938-4646

autor

Szindler Magdalena M.

• Department of Engineering Materials and Biomaterials, Silesian University of Technology, 18a Konarskiego St., 44-100 Gliwice, Poland

• https://orcid.org/0000-0002-6461-9449

autor

Orwat Justyna

• Department of Mining, Safety Engineering and Industrial Automation, Silesian University of Technology, 2 Akademicka St., 44-100 Gliwice, Poland

• https://orcid.org/0000-0002-6217-0385

autor

Kulesza-Matlak Grażyna

• Institute of Metallurgy and Materials Science of Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland

• https://orcid.org/0000-0001-9994-3321

Bibliografia

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Uwagi

This publication was supported under the scholarship fund of the Silesian University of Technology in the field of scientific research and development works, 2022.