High temperature resistance of silicide-coated niobium

• Autorzy: Szklarek Radosław , Tański Tomasz , Mendala Bogusław , Staszuk Marcin , Krzemiński Łukasz , Nuckowski Paweł , Sobczak Kamil

Identyfikatory

DOI

10.24425/bpasts.2021.137416

• Języki publikacji: EN

Abstrakty

EN

In this paper, thermal oxidation resistance of silicide-coated niobium substrates was tested in a temperature range of 1300–1450°C using an HVOF burner. Pure niobium specimens were coated using the pack cementation CVD method. Three different silicide thickness coatings were deposited. Thermal oxidation resistance of the coated niobium substrates was tested in a temperature range of 1300–1450°C using an HVOF burner. All samples that passed the test showed their ability to stabilize the temperature over a time of 30 s during the thermal test. The rise time of substrate temperature takes about 10 s, following which it keeps constant values. In order to assess the quality of the Nb-Si coatings before and after the thermal test, light microscopy, scanning electron microscopy (SEM) along with chemical analysis (EDS), X-ray diffraction XRD and Vickers hardness test investigation were performed. Results confirmed the presence of substrate Nb compounds as well as Si addition. The oxygen compounds are a result of high temperature intense oxidizing environment that causes the generation of SiO phase in the form of quartz and cristobalite during thermal testing. Except for one specimen, all substrate surfaces pass the high temperature oxidation test with no damages.

Słowa kluczowe

EN

niobium; silicide; thermal barrier coating; CVD; high-temperature oxidation resistance

PL

niob; krzemek; powłoka termoizolacyjna; CVD; odporność na utlenianie w wysokiej temperaturze

• Wydawca: Polska Akademia Nauk, Wydział IV Nauk Technicznych
• Czasopismo: Bulletin of the Polish Academy of Sciences. Technical Sciences
• Rocznik: 2021
• Tom: Vol. 69, nr 5
• Strony: art. no. e137416
• Opis fizyczny: Bibliogr. 27 poz., rys., tab.

Twórcy

autor

Szklarek Radosław

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland
• Spinex Spinkiewicz Company, Klimontowska 19, 04-672 Warsaw, Poland
• Łukasiewicz Research Network – Institute of Aviation, al. Krakowska 110/114, 02-256 Warsaw, Poland

autor

Tański Tomasz

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland

autor

Mendala Bogusław

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland

autor

Staszuk Marcin

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland

autor

Krzemiński Łukasz

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland

autor

Nuckowski Paweł

• Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland

autor

Sobczak Kamil

• Łukasiewicz Research Network – Institute of Aviation, al. Krakowska 110/114, 02-256 Warsaw, Poland

Bibliografia

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Uwagi

Opracowanie rekordu ze środków MNiSW, umowa Nr 461252 w ramach programu "Społeczna odpowiedzialność nauki" - moduł: Popularyzacja nauki i promocja sportu (2021).