Non-self-sustained discharge with hollow anode for plasma-based surface treatment

• Autorzy: Misiruk I. O. , Timoshenko O. I. , Taran V. S. , Garkusha I. E.

Identyfikatory

DOI

10.1515/nuka-2016-0033

• Konferencja: PLASMA-2015 International Conference on Research and Applications of Plasmas (7-11 September 2015 ; Warsaw, Poland)
• Języki publikacji: EN

Abstrakty

EN

The paper discusses plasma methods for surface modification using the non-self-sustained glow discharge with a hollow anode. This discharge is characterised by low voltage and high values of electron and ion currents. It can be easily excited in vacuum-arc installations that are widely used for coatings deposition. It is shown that such type of discharge may be effectively used for ion pumping, film deposition, ion etching, diffusion saturation of metallic materials, fusion and brazing of metals, and for combined application of above mentioned technologies in a single vacuum cycle.

Słowa kluczowe

EN

diffusion saturation; film deposition; hollow anode; ion etching; ion pumping; non-self-sustained glow discharge

• Wydawca: Institute of Nuclear Chemistry and Technology
• Czasopismo: Nukleonika
• Rocznik: 2016
• Tom: Vol. 61, No. 2
• Strony: 195--199
• Opis fizyczny: Bibliogr. 7 poz., rys.

Twórcy

autor

Misiruk I. O.

• Institute of Plasma Physics, NSC ‘Kharkiv Institute of Physics and Technology’, 1 Akademichna Str., 61108, Kharkiv, Ukraine
• Department of Applied Physics and Plasma Physics, School of Physics and Technology, V. N. Karazin Kharkiv National University, 4 Svobody sq., 61022 Kharkiv, Ukraine, Tel.: [phone], Fax: [phone]

autor

Timoshenko O. I.

• Institute of Plasma Physics, NSC ‘Kharkiv Institute of Physics and Technology’, 1 Akademichna Str., 61108, Kharkiv, Ukraine

autor

Taran V. S.

• Institute of Plasma Physics, NSC ‘Kharkiv Institute of Physics and Technology’, 1 Akademichna Str., 61108, Kharkiv, Ukraine

autor

Garkusha I. E.

• Institute of Plasma Physics, NSC ‘Kharkiv Institute of Physics and Technology’, 1 Akademichna Str., 61108, Kharkiv, Ukraine
• Department of Applied Physics and Plasma Physics, School of Physics and Technology, V. N. Karazin Kharkiv National University, 4 Svobody sq., 61022 Kharkiv, Ukraine, Tel.: [phone], Fax: [phone]

Bibliografia

• 1. Sablev, L. P., Andreev, A. A., Grigor’ev, S. N., & Metel, A. S. (1996). U.S. Patent No. 5,503,725. Washington, D.C.: U.S. Patent and Trademark Office.
• 2. Andreev, A. A., Sablev, L. P., Shulaev, V. M., & Grigor’ev, S. N. (2005). Vacuum-arc devices and coatings. Kharkiv: NSC KIPT Publisher.
• 3. Timoshenko, A. I., Taran, V. S., & Tereshin, V. I. (2007). Plasma characteristics of two-step vacuum--arc discharge and its application for a coatings deposition. Probl. Atom. Sci. Techn. Ser. Plasma Phys., 1(13), 179–181.
• 4. Timoshenko, A. I., Taran, V. S., & Misiruk, I. O. (2012). Nitriding, oxidation and carburization of titanium and steels in non-self-maintained gaseous discharge. Probl. Atom Sci. Techn. Ser. Plasma Phys., 6(82), 235–237.
• 5. Misiruk, I. O., Timoshenko, O. I., Taran, V. S., & Garkusha, I. E. (2014). Application of plasma nitriding in medical implants post-processing. Plasma Phys. Technol., 1(2), 58–60.
• 6. Pastuh, I. M. (2006). Theory and practice of nitriding in a glow discharge without hydrogen. Kharkiv: NSC KIPT Publisher.
• 7. Davis, J. R. (2004). Tensile testing (2nd ed.). Ohio, USA: ASM International.

Uwagi

PL

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.