Gear involute artifacts with sub-micron profile form deviations: manufacture and new design

• Autorzy: Ling Ming , Ling Siying , Yu Dianqing , Zhang Zhihao , Wang Fengtao , Wang Liding

Identyfikatory

DOI

10.24425/mms.2023.147952

• Języki publikacji: EN

Abstrakty

EN

Gear involute artifact (GIA) is a kind of calibration standard used for traceability of involute metrology. To machine GIAs with sub-micron profile form deviations, the effect on the involute profile deviations caused by the geometric deviations and 6-DoF errors of the machining tool based on the double roller-guide involute rolling generation mechanism was analysed. At the same time, a double roller-guide involute lapping instrument and a lapping method for GIAs was proposed for lapping and in-situ measuring the gear involute artifacts. Moreover, a new GIA with three design base radii (50 mm, 100 mm, and 131 mm) was proposed for more efficient calibration and was machined with profile form deviations of 0.3 μm (within evaluation length of 38 mm, 68 mm, 80 mm, respectively, measured by the Chinese National Institute of Metrology), and the surface roughness Ra of the involute flanks was less than 0.05 μm. The research supports small-batch manufacturing for high-precision GIAs.

Słowa kluczowe

EN

gear involute artifact; profile deviation; gear standard; involute metrology; gear metrology

• Wydawca: Komitet Metrologii i Aparatury Naukowej PAN
• Czasopismo: Metrology and Measurement Systems
• Rocznik: 2023
• Tom: Vol. 30, nr 4
• Strony: 655--673
• Opis fizyczny: Bibliogr. 19 poz., rys., tab., wykr., wzory

Twórcy

autor

Ling Ming

• Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116024, China

autor

Ling Siying

• Key Laboratory of Intelligent Manufacturing Technology of the Ministry of Education, Shantou University, Shantou 515063, China

autor

Yu Dianqing

• Liaoning Inspection, Examination & Certification Centre, Shenyang 110004, China

autor

Zhang Zhihao

• Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116024, China

autor

Wang Fengtao

• Key Laboratory of Intelligent Manufacturing Technology of the Ministry of Education, Shantou University, Shantou 515063, China

autor

Wang Liding

• Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116024, China

Bibliografia

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Uwagi

This work was funded by the National Natural Science Foundation of the People’s Republic of China (grant No. 52075067), the STU Scientific Research Initiation (grant No. NTF23008), the Guangdong Provincial University Innovation Team Project (grant No. 2020KCXTD012), and the Fundamental Research Funds for the Central Universities (grant No. DUT22LAB111). The authors would like to thank to the Chinese National Institute of Metrology for the measurements of GIAs.