Influence of the structural and surface properties on photocatalytic activity of TiO₂:Nd thin films

• Autorzy: Wojcieszak D. , Mazur M. , Kaczmarek D. , Morgiel J. , Poniedziałek A. , Domaradzki J. , Czeczot A.

Identyfikatory

DOI

10.1515/pjct-2015-0037

• Języki publikacji: EN

Abstrakty

EN

Titanium dioxide thin films doped with the same amount of neodymium were prepared using two different magnetron sputtering methods. Thin films of anatase structure were deposited with the aid of Low Pressure Hot Target Magnetron Sputtering, while rutile coatings were manufactured using High Energy Reactive Magnetron Sputtering process. The thin films composition was determined by energy dispersive spectroscopy and the amount of the dopant was equal to 1 at. %. Structural properties were evaluated using transmission electron microscopy and revealed that anatase films had fibrous structure, while rutile had densely packed columnar structure. Atomic force microscopy investigations showed that the surface of both films was homogenous and consisted of nanocrystalline grains. Photocatalytic activity was assessed based on the phenol decomposition. Results showed that both thin films were photocatalytically active, however coating with anatase phase decomposed higher amount of phenol. The transparency of both thin films was high and equal to ca. 80% in the visible wavelength range. The photoluminescence intensity was much higher in case of the coating with rutile structure.

Słowa kluczowe

EN

TiO2; neodymium; thin films; magnetron sputtering; photocatalysis; phenol decomposition

• Wydawca: West Pomeranian University of Technology. Publishing House
• Czasopismo: Polish Journal of Chemical Technology
• Rocznik: 2015
• Tom: Vol. 17, nr 2
• Strony: 103--111
• Opis fizyczny: Bibliogr. 56 poz., rys.

Twórcy

autor

Wojcieszak D.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Mazur M.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Kaczmarek D.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Morgiel J.

• Polish Academy of Sciences, Institute of Metallurgy and Materials Science, Reymonta 25, 30-059 Cracov, Poland

autor

Poniedziałek A.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Domaradzki J.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Czeczot A.

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

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