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This work presents the effect of Cu-doping on some optical properties of Cu:NiO thin film prepared by spray pyrolysis technique. UV-Visible spectrophotometer in the range 380-900 nm used to determine the absorbance spectra for various Cu-doping of Cu:NiO thin film. The transmittance and energy gap are decreased with increasing Cu-doping in the prepared films, while absorption coefficient, extinction coefficient, and skin depth are increased with increasing Cu-doping.
Słowa kluczowe
Rocznik
Tom
Strony
155--162
Opis fizyczny
Bibliogr. 19 poz., rys., wykr., wz.
Twórcy
autor
- Al_Mustansiriyah University, College of Education, Physics Department, Baghdad, Iraq
Bibliografia
- [1] W. L. Roth, Phys. Rev. 110 (1958) 1333.
- [2] A. Kuzmin, J. Purans, and A.Rodionov, J. Phys: Condens.Mater. 9(1997)6979.
- [3] E. Fujii, A. Tomozawa, H. Torii, R. Takayama, Jpn. J. Appl. Phys. 35(1996)L328.
- [4] H. Sato, T. Minami, S. Takata, T. Yamada, Thin Solid Films 236(1993)27.
- [5] K. Youshmura, T. Miki, S. Tanemura, Jpn. J. Appl. Phys. 34(1995)2440.
- [6] H. Kumagai, M. Matsumoto, K. Toyoda, M. Obara, J.Mater. Sci. Lett. 15(1996)1081.
- [7] Y. R. Park, K.J. Kim, “Solgel preparation and optical characterization of NiO and Ni1−xZnxOthinfilms”,Journal of CrystalGrowth258 (2003) 380–384.
- [8] B. A. Reguig, A. Khelil, L. Cattin, M. Morsli and J.C. Bernede,“Properties of NiO thin films deposited by intermittent spraypyrolysis process”, Applied Surface Science253 (2007) 4330–4334.
- [9] W. C. Yeh and M. Matsumura, “Chemical vapor deposition ofnickel oxide films from bis-π-cyclopentadienyl-nickel”, Jpn. J.Appl. Phys.36(1997) 6884–6887.
- [10] U. S. Joshi, R. Takahashi, Y. Matsumoto, H. Koinuma, “Structure of NiO and Li-doped NiO single crystalline thin layerswith atomically flat surface”,Thin Solid Films 486 (2005) 214–217.
- [11] Y. Kakehi S. Nakao, K. Satoh, T. Kusaka, “Room-temperatureepitaxial growth of NiO(111) thin films by pulsed laser deposition”,Journal of Crystal Growth237-239 (2002) 591–595.
- [12] H. L. Chen, Y.M. Lu, W.S. Hwang, “Thickness dependence of electrical and optical properties of sputtered nickel oxide films”,Thin Solid Films 498(2006) 266–270.
- [13] Ying Zhou, DonghongGu, YongyouGeng, FuxiGan, “Thermal,structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering”,Materials Science and Engineering B135 (2006) 125–128.
- [14] Y. M. Lu, W.S. Hwang, J.S. Yang, H.C. Chuang, “Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering”,Thin Solid Films 420-421 (2002) 54– 61.
- [15] H. L. Chen, Y.M. Lu, W.S. Hwang, “Characterization of sputtered NiO thin films”, Surface and Coatings Technology 198 (2005) 138–142.
- [16] J. Tauc, Amorphous and Liquid Semiconductors, London (1974).
- [17] R. A.Grenier, "Semiconductor Device", Electronic Energy Series, McGraw-Hill, Book Co. Inc.(1961).
- [18] Ludmila Ekertova, Physics of Thin Films, (1977).
- [19] J. F. Eloy, "Power Lasers", National School of Physics, Grenoble, France, JohnWiley & Sons (1984) 59.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-bff37b76-b161-4950-ae65-e6199fa9afc5