Investigation of noise in surface topography measurement using structured illumination microscopy

• Autorzy: Li Zhen , Gröger Sophie

Identyfikatory

DOI

10.24425/mms.2021.137706

• Języki publikacji: EN

Abstrakty

EN

Noise is a fundamental metrological characteristic of the instrument in surface topography measurement. Therefore, measurement noise should be thoroughly studied in practical measurement to understand instrument performance and optimize measurement strategy. This paper investigates the measurement noise at different measurement settings using structured illumination microscopy. The investigation shows that the measurement noise may scatter significantly among different measurement settings. Eliminating sample tilt, selecting low vertical scanning interval and high exposure time is helpful to reduce the measurement noise. In order to estimate the influence of noise on the measurement, an approach based on metrological characteristics is proposed. The paper provides a practical guide to understanding measurement noise in a wide range of applications.

Słowa kluczowe

EN

surface topography measurement; measurement noise; uncertainty; structured illumination microscopy

• Wydawca: Komitet Metrologii i Aparatury Naukowej PAN
• Czasopismo: Metrology and Measurement Systems
• Rocznik: 2021
• Tom: Vol. 28, nr 4
• Strony: 767--779
• Opis fizyczny: Bibliogr. 36 poz., rys., tab., wykr., wzory

Twórcy

autor

Li Zhen

• Chemnitz University of Technology, Department of Production Measuring Technology, Reichenhainer Straße 70, 09126 Chemnitz, Germany

autor

Gröger Sophie

• Chemnitz University of Technology, Department of Production Measuring Technology, Reichenhainer Straße 70, 09126 Chemnitz, Germany

Bibliografia

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Uwagi

1. The author Zhen Li acknowledges the Chinese Scholarship Council (CSC) for funding his doctoral study.

2. Opracowanie rekordu ze środków MNiSW, umowa Nr 461252 w ramach programu "Społeczna odpowiedzialność nauki" - moduł: Popularyzacja nauki i promocja sportu (2021).