Three-dimensional microstructures of photoresist formed by gradual gray-scale lithography approach

• Autorzy: Luo N , Gao Y , Zhimin Z , Mengchao X , Huaming W
• Konferencja: Bibliogr. 19 poz., rys. wykr.
• Języki publikacji: EN

Abstrakty

EN

We describe a simple and reliable approach, by employing a gradual gray-scale lithography process, which is developed for the fabrication of continuous 3D microstructure. A matrix equation has been built to quantitatively calculate the pattern gray and exposure time by combining the digital micromirror device (DMD) modulation characteristics. To avoid DMD pixel error induced by sampling, we also propose a new quantifying method in accordance with DMD pixel dimension to further improve the fabrication precision of the 3D photoresist profile. Finally, different photoresist microstructures with continuous profile, including axicon array and microlens array, have been successfully fabricated.

Słowa kluczowe

EN

gradual gray-scale lithography; DMD pixel error; axicon array; microlens array

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2012
• Tom: Vol. 42, nr 4
• Strony: 853--864

Twórcy

autor

Luo N

• College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hang Kong University, Nanchang 330063, China

autor

Gao Y

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hang Kong University, Nanchang 330063, China

autor

Zhimin Z

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hang Kong University, Nanchang 330063, China

autor

Mengchao X

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hang Kong University, Nanchang 330063, China

autor

Huaming W

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hang Kong University, Nanchang 330063, China

Bibliografia

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